Abstract: A fluid flow obstruction device for a process fluid flow measurement device includes a first wall having a first side. A second wall having a proximate end is arranged at a proximate end of the first side of the first wall. The arrangement forms a first apex between the first wall and the second wall. At least one additional wall is arranged parallel to the second wall at a distance from the proximate end of the first side of the first wall. The arrangement of the at least one additional wall and the first wall forms a corresponding additional apex.

Abstract: A fluid flow obstruction device for a process fluid flow measurement device includes a first wall having a first side. A second wall having a proximate end is arranged at a proximate end of the first side of the first wall. The arrangement forms a first apex between the first wall and the second wall. At least one additional wall is arranged parallel to the second wall at a distance from the proximate end of the first side of the first wall. The arrangement of the at least one additional wall and the first wall forms a corresponding additional apex.

Abstract: A self-draining transmitter mount head includes a head body with a transmitter process coupling port in the head body, an impulse port in the head body, and an impulse passage coupled to the impulse port. An impulse drain passage is coupled between the pressure transmitter port and the impulse passage. The impulse drain passage is positioned at an angle to the impulse passage, and relative to a head installation angle that positions the impulse drain passage to drain away from the transmitter process coupling port through a range of head installation angles.

Abstract: A self-draining transmitter mount head includes a head body with a transmitter process coupling port in the head body, an impulse port in the head body, and an impulse passage coupled to the impulse port. An impulse drain passage is coupled between the pressure transmitter port and the impulse passage. The impulse drain passage is positioned at an angle to the impulse passage, and relative to a head installation angle that positions the impulse drain passage to drain away from the transmitter process coupling port through a range of head installation angles.

Abstract: A pressure transmitter coupling for coupling a pressure transmitter to a process fluid includes a process coupling face having a process coupling port configured to couple to impulse piping. A pressure transmitter coupling face is arranged at an angle to the process coupling face, the pressure transmitter coupling face including a pressure transmitter coupling port configured to fluidically couple to the pressure transmitter. A process fluid passageway extends between the process coupling port and the pressure transmitter coupling port. A rod out port is aligned with the process fluid coupling port and configured to receive a cleaning rod therethrough to clean the process coupling port.

Abstract: An alignment device for a wafer in an industrial process assembly includes an inner surface shaped to conform to an outer surface of a wafer, an outer surface comprising at least two cams; and two ends connecting the inner surface to the outer surface. The two ends are positioned such that when the alignment device is positioned on the outer surface of the wafer, the alignment device extends more than one hundred eighty degrees around the wafer.

Abstract: A flow measurement probe includes an elongate probe having an averaging pitot tube with a plurality of upstream and downstream openings arranged along a length of the elongate probe, and a thermal flow measurement sensor coupled to the elongate probe. A method of measuring fluid flow rate in a process includes calculating a flow rate of the fluid using differential pressure in upstream and downstream openings of an averaging pitot tube in an elongate probe when the differential pressure is at least a defined measurement threshold, and calculating the flow rate of the fluid with a thermal mass flow sensor coupled to the flow measurement probe when the differential pressure is less than the defined measurement threshold.

Abstract: An alignment device for a wafer in an industrial process assembly includes an inner surface shaped to conform to an outer surface of a wafer, an outer surface comprising at least two cams; and two ends connecting the inner surface to the outer surface. The two ends are positioned such that when the alignment device is positioned on the outer surface of the wafer, the alignment device extends more than one hundred eighty degrees around the wafer.

Abstract: Systems and methods are disclosed for indicating bottoming contact between an inner wall of a fluid carrying conduit and a distal tip process measurement probe. A process device, such as a fluid flow meter, has a process measurement probe configured for insertion into the fluid carrying conduit. An insertion mechanism is coupled to the process measurement probe and configured to apply force to insert the process measurement probe into the fluid carrying conduit. A bottoming indicator is configured to provide an indication of proper bottoming of the distal tip of the process measurement probe against the inner wall of the fluid carrying conduit as a function of an insertion related force or pressure.

Abstract: A pressure transmitter coupling for coupling a pressure transmitter to a process fluid includes a process coupling face having a process coupling port configured to couple to impulse piping. A pressure transmitter coupling face is arranged at an angle to the process coupling face, the pressure transmitter coupling face including a pressure transmitter coupling port configured to fluidically couple to the pressure transmitter. A process fluid passageway extends between the process coupling port and the pressure transmitter coupling port. A rod out port is aligned with the process fluid coupling port and configured to receive a cleaning rod therethrough to clean the process coupling port.

Abstract: A flow measurement probe includes an elongate probe having an averaging pitot tube with a plurality of upstream and downstream openings arranged along a length of the elongate probe, and a thermal flow measurement sensor coupled to the elongate probe. A method of measuring fluid flow rate in a process includes calculating a flow rate of the fluid using differential pressure in upstream and downstream openings of an averaging pitot tube in an elongate probe when the differential pressure is at least a defined measurement threshold, and calculating the flow rate of the fluid with a thermal mass flow sensor coupled to the flow measurement probe when the differential pressure is less than the defined measurement threshold.

Abstract: Systems and methods are disclosed for indicating bottoming contact between an inner wall of a fluid carrying conduit and a distal tip process measurement probe. A process device, such as a fluid flow meter, has a process measurement probe configured for insertion into the fluid carrying conduit. An insertion mechanism is coupled to the process measurement probe and configured to apply force to insert the process measurement probe into the fluid carrying conduit. A bottoming indicator is configured to provide an indication of proper bottoming of the distal tip of the process measurement probe against the inner wall of the fluid carrying conduit as a function of an insertion related force or pressure.