Patents by Inventor Nathaniel Stanley

Nathaniel Stanley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEMS AND METHODS FOR PARAMETER OPTIMIZATION
    Publication number: 20250238676
    Abstract: Methods and systems that provide one or more recommended configurations to planners using large data sets in an efficient manner. These methods and systems provide optimization of objectives using a genetic algorithm that can provide parameter recommendations that optimize one or more objectives in an efficient and timely manner. The methods and systems disclosed herein are flexible enough to satisfy diverse use cases.
    Type: Application
    Filed: April 10, 2025
    Publication date: July 24, 2025
    Applicant: Kinaxis Inc.
    Inventors: Sebastien Ouellet, Phillip Williams, Nathaniel Stanley, Jeffery Downing, Liam Hebert
  • Systems and methods for parameter optimization
    Patent number: 11900259
    Abstract: Methods and systems that provide one or more recommended configurations to planners using large data sets in an efficient manner. These methods and systems provide optimization of objectives using a genetic algorithm that can provide parameter recommendations that optimize one or more objectives in an efficient and timely manner. The methods and systems disclosed herein are flexible enough to satisfy diverse use cases.
    Type: Grant
    Filed: October 25, 2022
    Date of Patent: February 13, 2024
    Assignee: Kinaxis Inc.
    Inventors: Sebastien Ouellet, Phillip Williams, Nathaniel Stanley, Jeffery Downing, Liam Hebert
  • Systems and methods for parameter optimization
    Patent number: 11514328
    Abstract: Methods and systems that provide one or more recommended configurations to planners using large data sets in an efficient manner. These methods and systems provide optimization of objectives using a genetic algorithm that can provide parameter recommendations that optimize one or more objectives in an efficient and timely manner. The methods and systems disclosed herein are flexible enough to satisfy diverse use cases.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: November 29, 2022
    Assignee: Kinaxis Inc.
    Inventors: Sebastien Ouellet, Phillip Williams, Nathaniel Stanley, Jeffery Downing, Liam Hebert
  • SYSTEMS AND METHODS FOR PARAMETER OPTIMIZATION
    Publication number: 20210342698
    Abstract: Methods and systems that provide one or more recommended configurations to planners using large data sets in an efficient manner. These methods and systems provide optimization of objectives using a genetic algorithm that can provide parameter recommendations that optimize one or more objectives in an efficient and timely manner. The methods and systems disclosed herein are flexible enough to satisfy diverse use cases.
    Type: Application
    Filed: May 4, 2020
    Publication date: November 4, 2021
    Inventors: Sebastien Ouellet, Phillip Williams, Nathaniel Stanley, Jeffery Downing, Liam Hebert
  • METHODS AND DEVICES FOR PROCESSING A PRECURSOR LAYER IN A GROUP VIA ENVIRONMENT
    Publication number: 20110081487
    Abstract: Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA-chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, the precursor is subsequently processed in a VIA environment.
    Type: Application
    Filed: September 2, 2010
    Publication date: April 7, 2011
    Inventors: Brent Bollman, Nathaniel Stanley, Matthew Diego Rail
  • Methods and Devices for Processing a Precursor Layer in a Group VIA Environment
    Publication number: 20100028533
    Abstract: Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA-chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, the precursor is subsequently processed in one or more steps in a VIA environment.
    Type: Application
    Filed: March 4, 2009
    Publication date: February 4, 2010
    Inventors: Brent Bollman, Craig Leidholm, Nathaniel Stanley, Matthew Rail