Patents by Inventor Navaneetha Krishnan Subbaiyan

Navaneetha Krishnan Subbaiyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240085361
    Abstract: A method of forming a sensor, such as a glass electrochemical sensor, is described. In some examples, the method may include forming a plurality of apertures in a glass substrate; forming a sensor body comprising the glass substrate and at least one glass sensor component, wherein one or more apertures of the glass substrate are aligned with the at least one glass sensor component to form an outer contact aperture; filling the outer contact aperture in the sensor body with a first conducting material to form an outer contact through glass via (TGV); and forming an electrode on the glass substrate adjacent at least one of the apertures of the plurality of apertures.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 14, 2024
    Inventors: Shrisudersan Jayaraman, Navaneetha Krishnan Subbaiyan
  • Patent number: 11846597
    Abstract: A method of forming a sensor, such as a glass electrochemical sensor, is described. In some examples, the method may include forming a plurality of apertures in a glass substrate; forming a sensor body comprising the glass substrate and at least one glass sensor component, wherein one or more apertures of the glass substrate are aligned with the at least one glass sensor component to form an outer contact aperture; filling the outer contact aperture in the sensor body with a first conducting material to form an outer contact through glass via (TGV); and forming an electrode on the glass substrate adjacent at least one of the apertures of the plurality of apertures.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: December 19, 2023
    Assignee: Corning Incorporated
    Inventors: Shrisudersan Jayaraman, Navaneetha Krishnan Subbaiyan
  • Patent number: 11680908
    Abstract: A waveguide sensor system is provided. The system includes a light source and a waveguide formed from a light transmitting material. Light from the light source enters the waveguide at an input area and travels within the waveguide by total internal reflection to an analyte area and light to be analyzed travels within the waveguide from the analyte area by total internal reflection to an output area. An optical sensor is coupled to the output area and is configured to interact with the light to be analyzed. The system includes a plurality of pores located along the outer surface within the analyte area and formed in the light transmitting material of the waveguide, and the pores are configured to enhance light interaction with the analyte within the analyte area. The pores and analyte area may be protected and/or enhanced with a hydrophobic layer overlaying the pores.
    Type: Grant
    Filed: April 3, 2020
    Date of Patent: June 20, 2023
    Assignee: CORNING INCORPORATED
    Inventors: Jeffrey Stapleton King, Navaneetha Krishnan Subbaiyan
  • Patent number: 11171094
    Abstract: According to various embodiments, an article including a glass or glass-ceramic substrate having a first major surface and a second major surface, and a via extending through the substrate from the first major surface to the second major surface over an axial length, L, the via defining a first axial portion, a third axial portion, and a second axial portion disposed between the first and third axial portions. The article further includes a helium hermetic adhesion layer disposed on the interior surface in the first and/or third axial portions and a metal connector disposed within the via, the metal connector being adhered to the helium hermetic adhesion layer. The metal connector fully fills the via over the axial length, L, the via has a maximum diameter, ?max, of less than or equal to 30 ?m, and the axial length, L, and the maximum diameter, ?max, satisfy an equation: L ? max > 20 ? ? micron 1 / 2 .
    Type: Grant
    Filed: January 16, 2020
    Date of Patent: November 9, 2021
    Assignee: Corning Incorporated
    Inventors: Prantik Mazumder, Chukwudi Azubuike Okoro, Ah-Young Park, Scott Christopher Pollard, Navaneetha Krishnan Subbaiyan
  • Patent number: 11158519
    Abstract: A method of forming an article, including: inserting a conductive material within a via a wafer, wherein the conductive material comprises a first alloy comprising a first metal and a second metal; and contacting the conductive material with a solution comprising ions of a third metal, wherein the ions of the third metal galvanically displace a portion of the second metal from the first alloy to form a second alloy with the first metal.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: October 26, 2021
    Assignee: Corning Incorporated
    Inventors: Navaneetha Krishnan Subbaiyan, William Richard Trutna
  • Publication number: 20200333279
    Abstract: A method of forming a sensor, such as a glass electrochemical sensor, is described. In some examples, the method may include forming a plurality of apertures in a glass substrate; forming a sensor body comprising the glass substrate and at least one glass sensor component, wherein one or more apertures of the glass substrate are aligned with the at least one glass sensor component to form an outer contact aperture; filling the outer contact aperture in the sensor body with a first conducting material to form an outer contact through glass via (TGV); and forming an electrode on the glass substrate adjacent at least one of the apertures of the plurality of apertures.
    Type: Application
    Filed: December 28, 2018
    Publication date: October 22, 2020
    Inventors: Shrisudersan Jayaraman, Navaneetha Krishnan Subbaiyan
  • Publication number: 20200251424
    Abstract: According to various embodiments, an article including a glass or glass-ceramic substrate having a first major surface and a second major surface, and a via extending through the substrate from the first major surface to the second major surface over an axial length, L, the via defining a first axial portion, a third axial portion, and a second axial portion disposed between the first and third axial portions. The article further includes a helium hermetic adhesion layer disposed on the interior surface in the first and/or third axial portions and a metal connector disposed within the via, the metal connector being adhered to the helium hermetic adhesion layer. The metal connector fully fills the via over the axial length, L, the via has a maximum diameter, ?max, of less than or equal to 30 ?m, and the axial length, L, and the maximum diameter, ?max, satisfy an equation: L ? max > 20 ? ? micron 1 / 2 .
    Type: Application
    Filed: January 16, 2020
    Publication date: August 6, 2020
    Inventors: Prantik Mazumder, Chukwudi Azubuike Okoro, Ah-Young Park, Scott Christopher Pollard, Navaneetha Krishnan Subbaiyan
  • Publication number: 20200240922
    Abstract: A waveguide sensor system is provided. The system includes a light source and a waveguide formed from a light transmitting material. Light from the light source enters the waveguide at an input area and travels within the waveguide by total internal reflection to an analyte area and light to be analyzed travels within the waveguide from the analyte area by total internal reflection to an output area. An optical sensor is coupled to the output area and is configured to interact with the light to be analyzed. The system includes a plurality of pores located along the outer surface within the analyte area and formed in the light transmitting material of the waveguide, and the pores are configured to enhance light interaction with the analyte within the analyte area. The pores and analyte area may be protected and/or enhanced with a hydrophobic layer overlaying the pores.
    Type: Application
    Filed: April 3, 2020
    Publication date: July 30, 2020
    Inventors: Jeffrey Stapleton King, Navaneetha Krishnan Subbaiyan
  • Publication number: 20200185272
    Abstract: A method of forming an article, including: inserting a conductive material within a via a wafer, wherein the conductive material comprises a first alloy comprising a first metal and a second metal; and contacting the conductive material with a solution comprising ions of a third metal, wherein the ions of the third metal galvanically displace a portion of the second metal from the first alloy to form a second alloy with the first metal.
    Type: Application
    Filed: November 12, 2019
    Publication date: June 11, 2020
    Inventors: Navaneetha Krishnan Subbaiyan, William Richard Trutna