Patents by Inventor NAVEEN THOMAS

NAVEEN THOMAS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11927635
    Abstract: A charge pump test configuration and corresponding method of operation are disclosed for determining charge pump efficiency without needing to obtain direct current measurements. A first number of clock edges (CEs) of a clock signal supplied to a first charge pump is determined over a period of time for a predetermined output current. The first charge pump is then connected with a charge pump under test (PUT) in a cascaded manner such that an output current of the first charge pump is supplied to the PUT as an input current. A second number of CEs of a clock signal supplied to the first charge pump is determined over the same period of time for the same predetermined output current from the PUT. The efficiency of the PUT can then be determined as the ratio of the first number of CEs to the second number of CEs, or vice versa.
    Type: Grant
    Filed: April 28, 2022
    Date of Patent: March 12, 2024
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Keyur Payak, Naveen Thomas
  • Publication number: 20230349972
    Abstract: A charge pump test configuration and corresponding method of operation are disclosed for determining charge pump efficiency without needing to obtain direct current measurements. A first number of clock edges (CEs) of a clock signal supplied to a first charge pump is determined over a period of time for a predetermined output current. The first charge pump is then connected with a charge pump under test (PUT) in a cascaded manner such that an output current of the first charge pump is supplied to the PUT as an input current. A second number of CEs of a clock signal supplied to the first charge pump is determined over the same period of time for the same predetermined output current from the PUT. The efficiency of the PUT can then be determined as the ratio of the first number of CEs to the second number of CEs, or vice versa.
    Type: Application
    Filed: April 28, 2022
    Publication date: November 2, 2023
    Inventors: KEYUR PAYAK, NAVEEN THOMAS
  • Publication number: 20230197422
    Abstract: A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.
    Type: Application
    Filed: December 20, 2021
    Publication date: June 22, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Kevin T. Ryan, Appu Naveen Thomas, Adam Calkins, Jay R. Wallace, Tyler Rockwell, Solomon Belangedi Basame, Kevin M. Daniels, Kevin Richard Verrier
  • Patent number: 11056319
    Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: July 6, 2021
    Assignee: APPLIED Materials, Inc.
    Inventors: Costel Biloiu, Appu Naveen Thomas, Tyler Rockwell, Frank Sinclair, Christopher Campbell
  • Publication number: 20210035779
    Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.
    Type: Application
    Filed: July 29, 2019
    Publication date: February 4, 2021
    Applicant: APPLIED Materials, Inc.
    Inventors: Costel Biloiu, Appu Naveen Thomas, Tyler Rockwell, Frank Sinclair, Christopher Campbell