Patents by Inventor Nawal Mal

Nawal Mal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070213494
    Abstract: Disclosed herein are a hybrid silica polymer applicable to electrochemical elements and a method for economical production thereof, the former excelling in thermal stability, mechanical stability, solvent resistance, and proton conductivity at low humidity. Said method includes a step of heating a mixture of 3-mercaptopropyltrialkoxylsilane, surfactant, water, and base or acid for their reaction with one another at 25 to 180° C., thereby giving a hybrid thiol group-containing silica polymer, and an optional step of oxidizing said hybrid thiol group-containing silica polymer with a peroxide, thereby giving a hybrid silica polymer which is composed of hybrid (thiol group-containing and/or sulfonic group-containing) silica polymer. The resulting silica polymer is used as a proton conducting material for electrochemical elements such as fuel cells, capacitors, and electrolytic cells.
    Type: Application
    Filed: April 8, 2005
    Publication date: September 13, 2007
    Applicant: Sony Corporation
    Inventors: Nawal Mal, Koichiro Hinokuma, Kazuhiro Noda