Patents by Inventor Neal P. Marmillion

Neal P. Marmillion has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deep trench process
    Patent number: 5605603
    Abstract: A high yield process for creating uniform deep trenches in a crystalline silicon substrate is disclosed. The process involves immobilizing a crystalline silicon substrate on an electrostatic chuck in a plasma etching apparatus, heating the silicon substrate by raising the cathode temperature to 30.degree. to 80.degree. C., exposing the silicon substrate to a plasma generated from HBr, NF.sub.3, and O.sub.2 ; and carrying out a plasma etch with the temperature of the cathode held at 30.degree. to 80.degree. C.
    Type: Grant
    Filed: March 29, 1995
    Date of Patent: February 25, 1997
    Assignee: International Business Machines Corporation
    Inventors: Dennis S. Grimard, Neal P. Marmillion