Patents by Inventor Neal R. Mielke

Neal R. Mielke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10658053
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: May 19, 2020
    Assignee: Intel Corporation
    Inventors: Shantanu R. Rajwade, Pranav Kalavade, Neal R. Mielke, Krishna K. Parat, Shyam Sunder Raghunathan
  • Publication number: 20180122487
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Application
    Filed: September 26, 2017
    Publication date: May 3, 2018
    Inventors: Shantanu R. RAJWADE, Pranav KALAVADE, Neal R. MIELKE, Krishna K. PARAT, Shyam Sunder RAGHUNATHAN
  • Patent number: 9792997
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Grant
    Filed: June 15, 2016
    Date of Patent: October 17, 2017
    Assignee: Intel Corporation
    Inventors: Shantanu R. Rajwade, Pranav Kalavade, Neal R. Mielke, Krishna K. Parat, Shyam Sunder Raghunathan
  • Patent number: 9740437
    Abstract: Methods and apparatus related to a mechanism for quickly adapting garbage collection resource allocation for an incoming I/O (Input/Output) workload are described. In one embodiment, non-volatile memory stores data corresponding to a first workload and a second workload. Allocation of one or more resources in the non-volatile memory is determined based at least in part on a determination of an average validity of one or more blocks, where the one or more candidate bands are to be processed during operation of the first workload or the second workload. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: August 22, 2017
    Assignee: Intel Corporation
    Inventors: Neal R. Mielke, Mark Anthony Golez, David J. Pelster, Paul D. Ruby, Xin Guo
  • Publication number: 20160372207
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Application
    Filed: June 15, 2016
    Publication date: December 22, 2016
    Inventors: Shantanu R. Rajwade, Pranav Kalavade, Neal R. Mielke, Krishna K. Parat, Shyam Sunder Raghunathan
  • Publication number: 20160283161
    Abstract: Methods and apparatus related to a mechanism for quickly adapting garbage collection resource allocation for an incoming I/O (Input/Output) workload are described. In one embodiment, non-volatile memory stores data corresponding to a first workload and a second workload. Allocation of one or more resources in the non-volatile memory is determined based at least in part on a determination of an average validity of one or more blocks, where the one or more candidate bands are to be processed during operation of the first workload or the second workload. Other embodiments are also disclosed and claimed.
    Type: Application
    Filed: March 27, 2015
    Publication date: September 29, 2016
    Applicant: Intel Corporation
    Inventors: Neal R. Mielke, Mark Anthony Golez, David J. Pelster, Paul D. Ruby, Xin Guo
  • Patent number: 9418752
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: August 16, 2016
    Assignee: Intel Corporation
    Inventors: Shantanu R Rajwade, Pranav Kalavade, Neal R Mielke, Krishna K Parat, Shyam Sunder Raghunathan
  • Publication number: 20150279476
    Abstract: The inhibit voltage is a voltage applied to wordlines adjacent to a program wordline having a memory cell to write during the program operation. The inhibit voltage for a program operation can be ramped up during the program pulse. Instead of applying a constant high inhibit voltage that results in the initial boosted channel potential reducing drastically due to leakage, a system can start the inhibit voltage lower and ramp the inhibit voltage up during the program pulse. The ramping up can be a continuous ramp or in finite discrete steps during the program pulse. Such ramping of inhibit voltage can provide better tradeoff between program disturb and inhibit disturb.
    Type: Application
    Filed: March 27, 2014
    Publication date: October 1, 2015
    Inventors: Shantanu R. Rajwade, Pranav Kalavade, Neal R. Mielke, Krishna K. Parat, Shyam Sunder Raghunathan
  • Patent number: 8650353
    Abstract: Described herein are an apparatus, system, and method for refreshing a non-volatile memory. The method comprises loading a time stamp, corresponding to data in a data location of a non-volatile memory, to a register; determining an elapsed time, corresponding to the data in the data location, according to the loaded time stamp; and refreshing data of the data location for which it is determined that the elapsed time exceeds a refresh time associated with the non-volatile memory.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: February 11, 2014
    Assignee: Intel Corporation
    Inventors: Hanmant P. Belgal, Xin Guo, Sai Krishna Mylavarapu, Neal R. Mielke
  • Patent number: 8400831
    Abstract: A method and apparatus for improving the endurance of flash memories. In one embodiment of the invention, a high electric field is provided to the control gate of a flash memory module. The high electric field applied to the flash memory module removes trapped charges between a control gate and an active area of the flash memory module. In one embodiment of the invention, the high electric field is applied to the control gate of the flash memory module prior to an erase operation of the flash memory module. By applying a high electric field to the control gate of the flash memory module, embodiments of the invention improve the Program/Erase cycling degradation of the single-level or multi-level cells of the flash memory module.
    Type: Grant
    Filed: November 29, 2010
    Date of Patent: March 19, 2013
    Assignee: Intel Corporation
    Inventors: Hoon Cho, Kiran Pangal, Krishna K. Parat, Neal R. Mielke, Pranav Kalavade, Iwen Chao
  • Publication number: 20130007344
    Abstract: Described herein are an apparatus, system, and method for refreshing a non-volatile memory. The method comprises loading a time stamp, corresponding to data in a data location of a non-volatile memory, to a register; determining an elapsed time, corresponding to the data in the data location, according to the loaded time stamp; and refreshing data of the data location for which it is determined that the elapsed time exceeds a refresh time associated with the non-volatile memory.
    Type: Application
    Filed: July 1, 2011
    Publication date: January 3, 2013
    Inventors: Hanmant P. Belgal, Xin Guo, Sai Krishna Mylavarapu, Neal R. Mielke
  • Publication number: 20120137048
    Abstract: A method and apparatus for improving the endurance of flash memories. In one embodiment of the invention, a high electric field is provided to the control gate of a flash memory module. The high electric field applied to the flash memory module removes trapped charges between a control gate and an active area of the flash memory module. In one embodiment of the invention, the high electric field is applied to the control gate of the flash memory module prior to an erase operation of the flash memory module. By applying a high electric field to the control gate of the flash memory module, embodiments of the invention improve the Program/Erase cycling degradation of the single-level or multi-level cells of the flash memory module.
    Type: Application
    Filed: November 29, 2010
    Publication date: May 31, 2012
    Inventors: Hoon Cho, Kiran Pangal, Krishna K. Parat, Neal R. Mielke, Pranav Kalavade, Iwen Chao
  • Patent number: 7835187
    Abstract: A method and device using bitline-bitline capacitance between adjacent bitlines to boost seed voltage in a memory device are provided. The method may include a precharge phase, a boost phase, an equalize phase, and a lock in phase. In one embodiment, the method may include boosting the seed voltage twice. The bitlines may be divided into one or more segments.
    Type: Grant
    Filed: October 31, 2008
    Date of Patent: November 16, 2010
    Assignee: Intel Corporation
    Inventors: Satoru Tamada, Neal R Mielke, Krishna Parat
  • Publication number: 20100110795
    Abstract: A method and device using bitline-bitline capacitance between adjacent bitlines to boost seed voltage in a memory device are provided. The method may include a precharge phase, a boost phase, an equalize phase, and a lock in phase. In one embodiment, the method may include boosting the seed voltage twice. The bitlines may be divided into one or more segments.
    Type: Application
    Filed: October 31, 2008
    Publication date: May 6, 2010
    Inventors: Satoru Tamada, Neal R. Mielke, Krishna Parat
  • Patent number: 6376899
    Abstract: An integrated circuit is provided. The integrated circuit includes a substrate and at least one dielectric layer and a metal layer formed upon the substrate. The at least one dielectric layer includes a terminal dielectric layer. The integrated circuit further includes a planar passivating layer formed upon the terminal dielectric layer.
    Type: Grant
    Filed: August 29, 2000
    Date of Patent: April 23, 2002
    Assignee: Intel Corporation
    Inventors: Krishna Seshan, Neal R. Mielke
  • Patent number: 6137155
    Abstract: An integrated circuit is provided. The integrated circuit includes a substrate and at least one dielectric layer and a metal layer formed upon the substrate. The at least one dielectric layer includes a terminal dielectric layer. The integrated circuit further includes a planar passivating layer formed upon the terminal dielectric layer.
    Type: Grant
    Filed: December 31, 1997
    Date of Patent: October 24, 2000
    Assignee: Intel Corporation
    Inventors: Krishna Seshan, Neal R. Mielke
  • Patent number: 5977639
    Abstract: The present invention provides in one embodiment thereof an integrated circuit (IC) that includes silicon substrate. The integrated circuit includes a plurality of dielectric and metal layers formed upon the silicon substrate. The plurality of dielectric and metal layers form a die active area. The metal have formed therein a first guard wall surrounding the die active area. The metal layers further have formed therein a second segmented guard wall. The segmented guard wall surrounds and staples the plurality of metal layers. The IC also includes a passivation layer adhering to the first and the segmented guard walls.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: November 2, 1999
    Assignee: Intel Corporation
    Inventors: Krishna Seshan, Neal R. Mielke
  • Patent number: 5386388
    Abstract: A reference scheme for verifying the erasing and programming in an electrically erasable and electrically programmable read-only memory fabricated on a silicon substrate which employs a plurality of memory cells, each of which contains a floating gate. The reference scheme employs trimmable single cell reference devices for both the erase verify and program verify operations. The threshold voltages of the reference cells are trimmed to a level below (in the case of the erase verify reference cell) or above (in the case of the program verify reference cell) which all memory cells in the array will be considered in a particular program state (i.e., erased or programmed). In the case of the read reference device, a double-cell read referencing device combining the erase and program verify reference cells is described. Although, the double-cell referencing device is preferred, a trimmable read reference device is also taught.
    Type: Grant
    Filed: June 28, 1993
    Date of Patent: January 31, 1995
    Assignee: Intel Corporation
    Inventors: Gregory E. Atwood, Owen W. Jungroth, Neal R. Mielke, Branislav Vajdic
  • Patent number: 5309012
    Abstract: A semiconductor memory having a memory cell for storing a bit of data and a pull-down transistor for coupling the source of the memory cell to ground in order to read the memory cell. The pull-down transistor is comprised of a polysilicon gate coupled to a control means for switching the transistor ON/OFF; a drain diffusion region coupled to the source of the memory cell; and a source diffusion region coupled to ground. The source diffusion region is physically located closer to the memory cell than the drain diffusion region. Two P.sup.+ substrate taps are implemented--one on each side of the pull-down transistor. An N.sup.+ diffusion bar is coupled to V.sub.SS. The N.sup.+ diffusion bar and the adjacent P.sup.+ substrate tap are interleaved in a row and are coupled to metal layers by vias and contacts.
    Type: Grant
    Filed: November 3, 1992
    Date of Patent: May 3, 1994
    Assignee: Intel Corporation
    Inventors: Jerry G. Jex, Neal R. Mielke
  • Patent number: 5301150
    Abstract: A single polysilicon layer electrically programmable and electrically erasable read only memory cell is described. The cell utilizes an n-well inversion capacitor, formed in a semiconductor substrate as the control gate. One plate of the capacitor is formed from the same polysilicon layer as the floating gate of the memory device, thus capacitively coupling the floating gate and the inversion capacitor control gate. Additional erase performance is achieved by addition of a dedicated erase capacitor to the basic cell. Still further improvement in programming performance and protection against over-erase failure in a flash type EEPROM device is achieved by the addition of a select transistor. Prevention of program disturb and DC erase is also described.
    Type: Grant
    Filed: June 22, 1992
    Date of Patent: April 5, 1994
    Assignee: Intel Corporation
    Inventors: Stephen F. Sullivan, Neal R. Mielke