Patents by Inventor Ned J. Chou

Ned J. Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for enhancing the adhesion of polymer surfaces by water vapor plasma treatment
    Patent number: 5019210
    Abstract: Method for water vapor plasma treating the surface of a polymer body to enhance the adhesion of a first and second polymer surface. The method is particularly useful for polyimide surfaces.
    Type: Grant
    Filed: April 3, 1989
    Date of Patent: May 28, 1991
    Assignee: International Business Machines Corporation
    Inventors: Ned J. Chou, Ronald D. Goldblatt, John E. Heidenreich, III, Steven E. Molis, Luis M. Ferreiro, deceased
  • High aspect ratio, high resolution mask fabrication
    Patent number: 4293374
    Abstract: A high aspect ratio collimating mask for use in ion beam epitaxy or ion implantation doping is formed through the use of damage-trail-forming materials which are irradiated through a mask and then etched. The high aspect ratio is obtained in part by the sequential formation of a plurality of spaced mask plates. The mask is useful in producing large scale integrated circuits by ion implantation during epitaxial growth of a crystal wafer.
    Type: Grant
    Filed: March 10, 1980
    Date of Patent: October 6, 1981
    Assignee: International Business Machines Corporation
    Inventors: Praveen Chaudhari, Ned J. Chou, Ralph Feder, Alan B. Fowler, James A. VanVechten