Patents by Inventor Neela Joshi

Neela Joshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dissolution rate modifiers for lift-off resists
    Patent number: 6303260
    Abstract: Compositions useful for a lift-off resist in a bilayer metal lift-off process, which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one actinic-absorbing dissolution rate modifier having the formulae of (IA) or (IB): in which each R1 and R2 is selected from the group consisting of hydrogen, unsubstituted or substituted alkyl, alkoxy, nitro, halo, amide or hydroxy or a combination thereof, X is an aromatic group and R3 and R4 are selected from the group consisting of hydrogen, an unsubstituted or substituted alkyl or arylsulfonyl; each m is an integer from 1 to 5 and each n is an integer from 1 to 4.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: October 16, 2001
    Assignee: MicroChem Corp.
    Inventors: Rodney J. Hurditch, Donald W. Johnson, Neela Joshi