Patents by Inventor Neeraj Pakala

Neeraj Pakala has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10245394
    Abstract: Methods and apparatuses for the pulmonary delivery of a composition, such as methods and apparatuses for dispersing dry powder medicaments for inhalation by a patient. Elements or aspects of the apparatuses, including receptacle puncturing, mechanisms, deoccluding devices, receptacle impacting devices, and receptacle lock devices or systems.
    Type: Grant
    Filed: October 15, 2013
    Date of Patent: April 2, 2019
    Inventors: Mark Glusker, George S Axford, William W Alston, John Palmer-Felgate, Jonathan Wilkins, Willard R Foss, Nagaraja Rao, Mark Postich, Neeraj Pakala, David S Maltz, Keith Ung
  • Publication number: 20140106551
    Abstract: Laser based processes are used alone or in combination to effectively process doped domains for semiconductors and/or current harvesting structures. For example, dopants can be driven into a silicon/germanium semiconductor layer from a bare silicon/germanium surface using a laser beam. Deep contacts have been found to be effective for producing efficient solar cells. Dielectric layers can be effectively patterned to provide for selected contact between the current collectors and the doped domains along the semiconductor surface. Rapid processing approaches are suitable for efficient production processes.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 17, 2014
    Applicant: NanoGram Corporation
    Inventors: Uma Srinivasan, Xin Zhou, Henry Hieslmair, Neeraj Pakala
  • Publication number: 20140034052
    Abstract: Methods and apparatuses for the pulmonary delivery of a composition, such as methods and apparatuses for dispersing dry powder medicaments for inhalation by a patient. Elements or aspects of the apparatuses, including receptacle puncturing, mechanisms, deoccluding devices, receptacle impacting devices, and receptacle lock devices or systems.
    Type: Application
    Filed: October 15, 2013
    Publication date: February 6, 2014
    Applicant: NOVARTIS AG
    Inventors: Mark GLUSKER, George S AXFORD, William W Alston, John PALMER-FELGATE, Jonathan WILKINS, Willard R FOSS, Nagaraja Rao, Mark POSTICH, Nagaraja RAO, Neeraj PAKALA, David S MALTZ, Keith UNG
  • Publication number: 20110256377
    Abstract: Photovoltaic elements can be formed by in-motion processing of a silicon ribbon. In some embodiments, only a single surface of a silicon ribbon is processed in-motion. In other embodiments both surfaces of a silicon ribbon is processed in-motion. In-motion processing can include, but is not limited to, formation of patterned or uniform doped regions within or along the silicon ribbon as well as the formation of patterned or uniform dielectric layers and/or electrically conductive elements on the silicon ribbon. After performing in-motion processing, additional processing steps can be performed after the ribbon is cut into portions. Furthermore, post-cut processing can include, but is not limited to, the formation of solar cells, photovoltaic modules, and solar panels.
    Type: Application
    Filed: November 17, 2010
    Publication date: October 20, 2011
    Inventors: Shivkumar Chiruvolu, Neeraj Pakala, Scott Ferguson, Kieran Drain
  • Publication number: 20100294352
    Abstract: Layered metal structures are patterned to form a surface with some locations having an alloy along the top surface at some locations and the original top metal layer at other locations along the surface. The alloy and original top metal layer can be selected to have differential etching properties such that the pattern of the alloy or original metal can be selectively etched to form a patterned metal interconnect. In general, the patterning is performed by localized heating that drives formation of the alloy at the heated locations. The metal patterning can be useful for solar cell applications as well as for electronics applications, such as display applications.
    Type: Application
    Filed: May 20, 2009
    Publication date: November 25, 2010
    Inventors: Uma Srinivasan, Neeraj Pakala, William A. Sanders, Henry Hieslmair
  • Publication number: 20100294349
    Abstract: Laser based processes are used alone or in combination to effectively process doped domains for semiconductors and/or current harvesting structures. For example, dopants can be driven into a silicon/germanium semiconductor layer from a bare silicon/germanium surface using a laser beam. Deep contacts have been found to be effective for producing efficient solar cells. Dielectric layers can be effectively patterned to provide for selected contact between the current collectors and the doped domains along the semiconductor surface. Rapid processing approaches are suitable for efficient production processes.
    Type: Application
    Filed: May 20, 2009
    Publication date: November 25, 2010
    Inventors: Uma Srinivasan, Xin Zhou, Henry Hieslmair, Neeraj Pakala