Abstract: The invention concerns a mirror (14), in particular for a photovoltaic cell (10), comprising a stack of layers (SC1, SC2, SC3, SC4, SC5, SC6), the layers (SC1, SC2, SC3, SC4, SC5, SC6) being superimposed along a stacking direction, the stack comprising: a first layer (SC1) of transparent conductive oxide, a second optical reflection layer (SC4) of metal, and a third layer (SC6) of conductive oxide.

Abstract: A chemical bath for depositing a layer made from at least metal and sulphur is described. Furthermore, a method for depositing such a layer is described. This bath comprises, in solution: a metal salt comprising a metal chosen from at least one of the elements from groups IIB and MA of the periodic table; and a sulphur precursor. The bath further comprises a morpholine compound.

Abstract: A chemical bath for depositing a layer made from at least metal and sulphur is described. A method for depositing such a layer is also presented. The bath comprises, in solution: a metal salt comprising a metal chosen from at least one of the elements from groups BIB and MA of the periodic table; and a sulphur precursor. The bath further comprises a persulfate compound.

Abstract: Thin-layer photovoltaic cell structure with mirror layer. The invention relates to a photovoltaic cell structure intended for solar panel applications. The thin layer photovoltaic cell structure comprises at least one I-III-VI2 alloy layer (CIGS) with photovoltaic properties for the conversion of illuminating light into electricity. In particular, the structure comprises at least: one mirror layer (MR) comprising a surface reflecting (FR) a part of the illuminating light, where said reflecting surface (FR) is facing a first face (F1) of the I-III-VI2 alloy layer for receiving reflected illuminating light on said first face; and one or more first layers (CA, ENC) transparent to the illuminating light for receiving transmitted illuminating light on a second face (F2) of the I-III-VI2 alloy layer opposite to the first face (F1).

Abstract: The invention relates to a method for production of thin layers of semiconductor alloys of the I-III-VI2 type, including sulphur, for photovoltaic applications, whereby a heterostructure is firstly deposited on a substrate comprising a thin layer of precursor I-III-VI2 which is essentially amorphous and a thin layer, including at least some sulphur, the heterostructure is then annealed to promote the diffusion of the sulphur into the precursor layer and the at least partial crystallization of the I-III-VI2 alloy of the precursor layer with a stoichiometry which hence includes sulphur. A layer of selenium may also be deposited to assist the recrystallization processes or annealing.

Abstract: The invention relates to a method for production of thin layers of semiconductor alloys of the I-III-VI2 type, including sulphur, for photovoltaic applications, whereby a heterostructure is firstly deposited on a substrate comprising a thin layer of precursor I-III-VI2 which is essentially amorphous and a thin layer, including at least some sulphur, the heterostructure is then annealed to promote the diffusion of the sulphur into the precursor layer and the at least partial crystallization of the I-III-VI2 alloy of the precursor layer with a stoichiometry which hence includes sulphur. A layer of selenium may also be deposited to assist the recrystallization processes or annealing.