Patents by Inventor Neha Pal

Neha Pal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROVIDING METRIC DATA FOR PATTERNS USABLE IN A MODELING ENVIRONMENT
    Publication number: 20230409296
    Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.
    Type: Application
    Filed: August 29, 2023
    Publication date: December 21, 2023
    Applicant: The MathWorks, Inc.
    Inventors: Huanhuan Xu, Partha Biswas, Madhav Rajan, Sherman Braganza, Chirag Gupta, Neha Pal, Radhey Shyam Meena
  • Providing metric data for patterns usable in a modeling environment
    Patent number: 11782682
    Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.
    Type: Grant
    Filed: July 13, 2021
    Date of Patent: October 10, 2023
    Assignee: The Math Works, Inc.
    Inventors: Huanhuan Xu, Partha Biswas, Madhav Rajan, Sherman Braganza, Chirag Gupta, Neha Pal, Radhey Shyam Meena
  • PROVIDING METRIC DATA FOR PATTERNS USABLE IN A MODELING ENVIRONMENT
    Publication number: 20230021771
    Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 26, 2023
    Applicant: The MathWorks, Inc.
    Inventors: Huanhuan Xu, Partha Biswas, Madhav Rajan, Sherman Braganza, Chirag Gupta, Neha Pal, Radhey Shyam Meena