Patents by Inventor Nei-Jen Hsiao

Nei-Jen Hsiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thin film transistor and method of forming thin film transistor
    Patent number: 7348609
    Abstract: The thin film transistor has a non-transparent structure besides and insulated with the gate. Hence, the light transmitted from the substrate is blocked and the light current induced in the thin film transistor is negligible. The method uses a mask with a slit pattern to form a non-uniform photoresist. Hence, the mask could be used to pattern two conductor layers for forming source/drain/channel.
    Type: Grant
    Filed: December 7, 2005
    Date of Patent: March 25, 2008
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Hung-Jen Chu, Nei-Jen Hsiao, Hui-Chung Shen, Meng-Chi Liou
  • Conducting wire structure for a liquid crystal display
    Publication number: 20060256272
    Abstract: The present invention provides a conducting wire structure for a liquid crystal display. This structure uses bent conducting wires to connect the peripheral terminals with the pixel region. These bent conducting wires are designed to form different lengths or widths to achieve equal resistance and to fit in the cramped space between the pixel region and the peripheral terminals.
    Type: Application
    Filed: July 12, 2006
    Publication date: November 16, 2006
    Applicant: Chunghwa Picture Tubes, Ltd.
    Inventors: Meng-Chi Liou, Yung-Hui Chang, Nei-Jen Hsiao, Fu-Yuan Shiau
  • Thin film transistor and method of forming thin film transistor
    Publication number: 20060081855
    Abstract: The thin film transistor has a non-transparent structure besides and insulated with the gate. Hence, the light transmitted from the substrate is blocked and the light current induced in the thin film transistor is negligible. The method uses a mask with a slit pattern to form a non-uniform photoresist. Hence, the mask could be used to pattern two conductor layers for forming source/drain/channel.
    Type: Application
    Filed: December 7, 2005
    Publication date: April 20, 2006
    Inventors: Hung-Jen Chu, Nei-Jen Hsiao, Hui-Chung Shen, Meng-Chi Liou
  • Thin film transistor and method of forming thin film transistor
    Patent number: 6995045
    Abstract: The thin film transistor has a non-transparent structure besides and insulated with the gate. Hence, the light transmitted from the substrate is blocked and the light current induced in the thin film transistor is negligible. The method uses a mask with a slit pattern to form a non-uniform photoresist. Hence, the mask could be used to pattern two conductor layers for forming source/drain/channel.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: February 7, 2006
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Hung-Jen Chu, Nei-Jen Hsiao, Hui-Chung Shen, Meng-Chi Liou
  • Conducting wire structure for a liquid crystal display
    Publication number: 20040239863
    Abstract: The present invention provides a conducting wire structure for a liquid crystal display. This structure uses bent conducting wires to connect the peripheral terminals with the pixel region. These bent conducting wires are designed to form different lengths or widths to achieve equal resistance and to fit in the cramped space between the pixel region and the peripheral terminals.
    Type: Application
    Filed: September 4, 2003
    Publication date: December 2, 2004
    Applicant: Chunghawa Picture Tubes, Ltd.
    Inventors: Meng-Chi Liou, Yung-Hui Chang, Nei-Jen Hsiao, Fu-Yuan Shiau
  • Thin film transistor and method of forming thin film transistor
    Publication number: 20040173848
    Abstract: The thin film transistor has a non-transparent structure besides and insulated with the gate. Hence, the light transmitted from the substrate is blocked and the light current induced in the thin film transistor is negligible. The method uses a mask with a slit pattern to form a non-uniform photoresist. Hence, the mask could be used to pattern two conductor layers for forming source/drain/channel.
    Type: Application
    Filed: March 5, 2003
    Publication date: September 9, 2004
    Inventors: Hung-Jen Chu, Nei-Jen Hsiao, Hui-Chung Shen, Meng-Chi Liou