Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.

Abstract: In an example method, a water-soluble protective coating solution is applied over a bonding region and either i) a patterned region of a patterned structure or ii) a lane region of a non-patterned structure. The patterned region includes depressions having at least a polymeric hydrogel therein, and interstitial regions separating the depressions. The lane region includes a lane having at least the polymeric hydrogel therein. The water-soluble protective coating solution is dried to form a solid coating or a gel coating over the bonding region and over either i) the patterned region or ii) the lane region. Portions of the solid coating or the gel coating are selectively removed from the bonding region while leaving other portions of the solid coating or the gel coating over either i) the patterned region or ii) the lane region.

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.