Patents by Inventor Neil M. Benjamin

Neil M. Benjamin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for physical vapor deposition
    Patent number: 6168690
    Abstract: The invention relates to an improved sputter target that is a combination sputter target and induction antenna. In one embodiment, when the sputter target is energized sputter material particles are sputtered away from the sputter target and a plasma is induced. In another embodiment, the sputter target is energized by an energy source. In yet another embodiment, the energy source includes a bias power supply and an induction power supply. The bias power supply applies a potential to the sputter target relative to an object. The induction power supply applies a current to the sputter target. The potential and the current promote the sputtering away of the sputter target, the formation of the plasma and the anisotropic distribution of the sputtered material particles.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: January 2, 2001
    Assignee: Lam Research Corporation
    Inventors: Russell F. Jewett, Neil M. Benjamin, Andrew J. Perry, Vahid Vahedi