Patents by Inventor Neng-Hui Chu

Neng-Hui Chu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Propylene glycol monomethyl ether butyrates and isomers, and the process for the preparation thereof
    Patent number: 5426214
    Abstract: Propylene glycol monomethyl ether butyrates and their isomers are obtained by the esterification of propylene glycol monomethyl ether or its isomer with iso-butyric or n-butyric acid at an elevated temperature above 80.degree. C. in the presence of acidic catalyst and azeotropic agent. These compounds are rectified for removing acid residue and moisture in order to yield the desirable product having high purity.
    Type: Grant
    Filed: April 29, 1994
    Date of Patent: June 20, 1995
    Assignee: Shiny Chemical Industrial Co., Ltd.
    Inventors: Tzong-Jeng Chu, Neng-Hui Chu, Huang Kuo-Chu, Chin Y. Lee
  • Propylene glycol monomethyl ether propionate compounds and the process for the preparation thereof
    Patent number: 5321152
    Abstract: Propylene glycol monomethyl ether propionate compounds are obtained by the esterification of propylene glycol monomethyl ether with propionic acid at an elevated temperature above 80.degree. C. in the presence of acidic catalyst and azeotropic agent. The compounds are rectified for removing acid residue and moisture in order to yield the desirable product having high purity.
    Type: Grant
    Filed: August 2, 1993
    Date of Patent: June 14, 1994
    Assignee: Shiny Chemical Industrial Co., Ltd.
    Inventors: Tzong-Jeng Chu, Neng-Hui Chu, Peng-Fei Lee
  • Propylene glycol monomethyl ether propionate compound and the process for the preparation thereof
    Patent number: 5239111
    Abstract: A propylene glycol monomethyl ether propionate compound is obtained by the esterification of propylene glycol monomethyl ether with propionic acid at an elevated temperature above 80 .degree.C. in the presence of acidic catalyst and azeotropic agent. This compound is rectified for removing acid residue and moisture in order to yield the desirable product having high purity.
    Type: Grant
    Filed: October 14, 1992
    Date of Patent: August 24, 1993
    Assignee: Shiny Chemical Industrial Co., Ltd.
    Inventors: Tzong-Jeng Chu, Neng-Hui Chu, Peng-Fei Lee