Nestor O. Farmiga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially. In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool.
May 28, 1997
Date of Patent:
April 27, 1999
Thomas J. Dunn, Nestor O. Farmiga, Kanti Jain
Abstract: An internally-mirrored tube of constant cross-section, for use as a beam-shaper-uniformizer in an optical lithography tool, requires precision assembly, closely approaching total internal reflection, to be able to accept at the entry end a beam of laser light of specified numerical aperture, having an arbitrary cross-section and a non-uniform intensity profile, and deliver at the exit a beam having the same numerical aperture, the desired cross-sectional shape, and a substantially uniform intensity profile across the illuminated area. Imperfections at the edges of the component slabs would interfere with operation. The difficulty of machining internal surfaces to mirror smoothness, and the difficulty of applying mirror finishes to internal surfaces, suggests that the uniformizer be assembled from mirrored slabs cemented together. Achieving precision without breakage or scuffing of mirrors is difficult.
Abstract: A three-dimensional Universal Mounting Component (UMC) system of UMC blocks provides general mounting for use in optical research in constructing layouts for experiments and breadboard-type prototypes. In such optical layouts laser beams or other light beams are directed about complex paths, often on several planes or levels. Use of the invention overcomes the problem of creating three-dimensional optical layouts with less standardized, and much more expensive, mounting adapters and posts. An economical, standardized set of UMC blocks, each with a number of holes in grid configurations, enables users to construct custom three-dimensional optical layouts. Each UMC block is a right rectangular solid of substantial standardized thickness sufficient to support it on edge. Each UMC block has a set of smooth counterbored holes from front to back and has another set of such holes from back to front.