Patents by Inventor Nezih Uenal

Nezih Uenal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10401737
    Abstract: A technique and method for determining a process dose for a beam lithography process includes accessing a data set that enables associating (i) a plurality of measured dimensions of features exposed by beam lithography with (ii) a plurality of different exposure doses, wherein the features were exposed with the different exposure doses, and with (iii) at least one of a plurality of different densities of the exposed features and a plurality of different nominal dimensions of the exposed features. The method also includes providing a model that is parameterized in at least the following parameters (i) measured feature dimension; (ii) exposure dose; (iii) at least one of feature density and nominal feature dimension; (iv) process dose; and (v) at least one process bias. In a further step, the method includes fitting the model with the data set to determine the process dose and the process bias.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: September 3, 2019
    Assignee: GenISys GmbH
    Inventors: Ulrich Hofmann, Nezih Uenal
  • Publication number: 20180173108
    Abstract: A technique and method for determining a process dose for a beam lithography process includes accessing a data set that enables associating (i) a plurality of measured dimensions of features exposed by beam lithography with (ii) a plurality of different exposure doses, wherein the features were exposed with the different exposure doses, and with (iii) at least one of a plurality of different densities of the exposed features and a plurality of different nominal dimensions of the exposed features. The method also includes providing a model that is parameterized in at least the following parameters (i) measured feature dimension; (ii) exposure dose; (iii) at least one of feature density and nominal feature dimension; (iv) process dose; and (v) at least one process bias. In a further step, the method includes fitting the model with the data set to determine the process dose and the process bias.
    Type: Application
    Filed: October 17, 2017
    Publication date: June 21, 2018
    Applicant: GenISys GmbH
    Inventors: Ulrich Hofmann, Nezih Uenal