Patents by Inventor Ni-Eun Kim

Ni-Eun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflective photomask and method of fabricating the same
    Patent number: 8377613
    Abstract: A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on a lower surface of the photomask substrate, for determining locations of defects in the photomask pattern.
    Type: Grant
    Filed: January 24, 2012
    Date of Patent: February 19, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ni-Eun Kim, Yunsong Jeong
  • REFLECTIVE PHOTOMASK AND METHOD OF FABRICATING THE SAME
    Publication number: 20120122022
    Abstract: A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on a lower surface of the photomask substrate, for determining locations of defects in the photomask pattern.
    Type: Application
    Filed: January 24, 2012
    Publication date: May 17, 2012
    Inventors: Ni-Eun KIM, Yunsong Jeong
  • Reflective photomask and method of fabricating the same
    Patent number: 8142962
    Abstract: A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on a lower surface of the photomask substrate, for determining locations of defects in the photomask pattern.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: March 27, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ni-Eun Kim, Yunsong Jeong
  • REFLECTIVE PHOTOMASK AND METHOD OF FABRICATING THE SAME
    Publication number: 20100233593
    Abstract: A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on a lower surface of the photomask substrate, for determining locations of defects in the photomask pattern.
    Type: Application
    Filed: March 15, 2010
    Publication date: September 16, 2010
    Inventors: Ni-Eun Kim, Yunsong Jeong