Patents by Inventor Niahn-Mauh Shih

Niahn-Mauh Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Detection of lens anti-reflective coating decay by undesired residue detection
    Patent number: 7016029
    Abstract: Detecting decay of equipment lens anti-reflective coating (ARC) by detecting undesired residue is disclosed. The undesired residue detected correlates with the decay of the ARC, where a greater amount of undesired residue detected indicates a greater level of the decay. The undesired residue is detected due to stray light reflected by the ARC because of its decay. In the context of semiconductor fabrication equipment, photoresist residue results from negative photoresist on a semiconductor wafer, and may be viewed on one or more scribe lines of a mask within a field of view of the lens of the semiconductor fabrication equipment.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: March 21, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hung-Chih Chen, Chao-Hsiung Wang, Niahn-Mauh Shih, Hsien-Wei Chin
  • Detection of lens anti-reflective coating decay by undesired residue detection
    Publication number: 20030228531
    Abstract: Detecting decay of equipment lens anti-reflective coating (ARC) by detecting undesired residue is disclosed. The undesired residue detected correlates with the decay of the ARC, where a greater amount of undesired residue detected indicates a greater level of the decay. The undesired residue is detected due to stray light reflected by the ARC because of its decay. In the context of semiconductor fabrication equipment, photoresist residue results from negative photoresist on a semiconductor wafer, and may be viewed on one or more scribe lines of a mask within a field of view of the lens of the semiconductor fabrication equipment.
    Type: Application
    Filed: June 11, 2002
    Publication date: December 11, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hung-Chih Chen, Chao-Hsiung Wang, Niahn-Mauh Shih, Hsien-Wei Chin