Patents by Inventor Nicholas A. Stacey

Nicholas A. Stacey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8616873
    Abstract: A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: December 31, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Michael N. Miller, Frank Y. Xu, Nicholas A. Stacey
  • Patent number: 8076386
    Abstract: The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.
    Type: Grant
    Filed: February 23, 2004
    Date of Patent: December 13, 2011
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas
    Inventors: Frank Y. Xu, Michael P. C. Watts, Nicholas A. Stacey
  • Publication number: 20110183027
    Abstract: A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.
    Type: Application
    Filed: January 26, 2011
    Publication date: July 28, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Michael N. Miller, Frank Y. Xu, Nicholas A. Stacey
  • Patent number: 7939131
    Abstract: The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: May 10, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Christopher J. Mackay, Pankaj B. Lad, Ian M. McMackin, Van N. Truskett, Wesley D. Martin, Edward B. Fletcher, David C. Wang, Nicholas A. Stacey, Michael P. C. Watts
  • Patent number: 7906058
    Abstract: A method for spreading a conformable material between a substrate and a template having a mold. The method comprises positioning the mold to be in superimposition with the substrate defining a volume therebetween. A first sub-portion of the volume is charged with the conformable material through capillary action between the conformable material and one of the mold and the substrate. A second sub-portion of the volume is filled with the conformable material by creating a deformation in the mold.
    Type: Grant
    Filed: December 16, 2005
    Date of Patent: March 15, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Michael N. Miller, Nicholas A. Stacey, Michael P. C. Watts
  • Patent number: 7906060
    Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: March 15, 2011
    Assignee: Board of Regents, The University of Texas System
    Inventors: Carlton Grant Willson, Nicholas A. Stacey
  • Patent number: 7803308
    Abstract: The present invention provides a method for separating a mold from solidified imprinting material that includes creating deformation in the template in which the mold is included. The deformation is sufficient to create a returning force that is greater than an adhesion forced between the solidified imprinting material and the mold. For example, the deformation may result from a pressure differential created between the mold and a side of the template disposed opposite to the mold. In this manner, the distortion may be undulations in the template of sufficient magnitude to contact a substrate upon which the solidified imprinting material is disposed.
    Type: Grant
    Filed: December 1, 2005
    Date of Patent: September 28, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Michael N. Miller, Nicholas A. Stacey
  • Publication number: 20100112310
    Abstract: Systems and methods for providing identification patterns on substrates are described.
    Type: Application
    Filed: October 28, 2009
    Publication date: May 6, 2010
    Applicant: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Gerard M. Schmid, Michael N. Miller, Douglas J. Resnick, Benjamin G. Eynon, JR., Byung-Jin Choi, Kosta S. Selinidis, Sidlgata V. Sreenivasan, Nicholas A. Stacey
  • Patent number: 7547398
    Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: June 16, 2009
    Assignee: Molecular Imprints, Inc.
    Inventors: Gerard M. Schmid, Nicholas A Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron
  • Patent number: 7531025
    Abstract: The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: May 12, 2009
    Assignees: Molecular Imprints, Inc., Board of Regents, University of Texas System
    Inventors: Ian M. McMackin, Nicholas A. Stacey, Daniel A. Babbs, Duane J. Voth, Mathew P. C. Watts, Van N. Truskett, Frank Y. Xu, Ronald D. Voisin, Pankaj B. Lad
  • Publication number: 20080303187
    Abstract: An imprint lithography template with an active area arranged to receive imprinting material during an imprint lithography process and a non-active area adjacent the active area is described. At least a portion of the non-active area is treated to inhibit flow of the imprinting material from the active area to the non-active area during the imprint lithography process.
    Type: Application
    Filed: December 28, 2007
    Publication date: December 11, 2008
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Nicholas A. Stacey, Edward Brian Fletcher, Michael N. Miller, Michael P.C. Watts
  • Publication number: 20080230959
    Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.
    Type: Application
    Filed: April 18, 2008
    Publication date: September 25, 2008
    Applicant: Board of Regents, University of Texas System
    Inventors: C. Grant Willson, Nicholas A. Stacey
  • Patent number: 7365103
    Abstract: A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: April 29, 2008
    Assignee: Board of Regents, The University of Texas System
    Inventors: C. Grant Willson, Nicholas A. Stacey
  • Publication number: 20070243655
    Abstract: A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 18, 2007
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Gerard M. Schmid, Nicholas A. Stacey, Douglas J. Resnick, Ronald D. Voisin, Lawrence J. Myron
  • Patent number: 7282550
    Abstract: The present invention includes a composition to form a layer on a substrate having uniform etch characteristics. To that end, the composition has a plurality of components, a subset of which has substantially similar rates of evaporation for an interval of time.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: October 16, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Nicholas A. Stacey
  • Patent number: 7270533
    Abstract: The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: September 18, 2007
    Assignees: University of Texas System, Board of Regents, Molecular Imprints, Inc.
    Inventors: Ian M. McMackin, Nicholas A. Stacey, Daniel A. Babbs, Duane J. Voth, Mathew P. C. Watts, Van N. Truskett, Frank Y. Xu, Ronald D. Voisin, Pankaj B. Lad
  • Patent number: 7241395
    Abstract: The present invention features a method of patterning a substrate that includes forming, on the substrate, a first film having an original pattern that includes a plurality of projections a subset of which extends from a nadir surface terminating in an apex surface defining a height therebetween. A second film is disposed upon the first film and defines a surface spaced-apart from the apex surface of the plurality of projections. A variation in a distance between the apex surface of any one of the plurality of projections and the surface being within a predetermined range. A recorded pattern is transferred onto the substrate that corresponds to the original pattern, within the predetermined range being selected to minimize pattern distortions in the recorded pattern.
    Type: Grant
    Filed: September 21, 2004
    Date of Patent: July 10, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Nicholas A. Stacey
  • Publication number: 20070126156
    Abstract: The present invention provides a method for separating a mold from solidified imprinting material that includes creating deformation in the template in which the mold is included. The deformation is sufficient to create a returning force that is greater than an adhesion forced between the solidified imprinting material and the mold. For example, the deformation may result from a pressure differential created between the mold and a side of the template disposed opposite to the mold. In this manner, the distortion may be undulations in the template of sufficient magnitude to contact a substrate upon which the solidified imprinting material is disposed.
    Type: Application
    Filed: December 1, 2005
    Publication date: June 7, 2007
    Inventors: GanapathiSubramanian Mahadevan, Byung-Jin Choi, Michael Miller, Nicholas Stacey
  • Publication number: 20070126150
    Abstract: A method for spreading a conformable material between a substrate and a template having a mold. The method comprises positioning the mold to be in superimposition with the substrate defining a volume therebetween. A first sub-portion of the volume is charged with the conformable material through capillary action between the conformable material and one of the mold and the substrate. A second sub-portion of the volume is filled with the conformable material by creating a deformation in the mold.
    Type: Application
    Filed: December 16, 2005
    Publication date: June 7, 2007
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Michael Miller, Nicholas Stacey, Michael Watts
  • Patent number: 7205244
    Abstract: The present invention features a method of patterning a substrate that includes forming, on the substrate, a multi-layer film with a surface, an etch rate interface and an etch-differential interface. The etch-differential interface is defined between the etch rate interface and the surface. A recorded pattern is transferred onto the substrate defined, in part, by the etch-differential interface.
    Type: Grant
    Filed: September 21, 2004
    Date of Patent: April 17, 2007
    Assignee: Molecular Imprints
    Inventors: Nicholas A. Stacey, Sidlgata V. Sreenivasan, Michael N. Miller