Abstract: A vapour deposited coating on the surface of a metal, such as a stainless steel substrate, obtained in a plasma vapour depositing device having magnetic vapour stream filtering means. The vapour deposited coating comprises pairs of a metal layer and a ceramic metal compound (“ceramic”) layer. The metal layer deposited is one of titanium, chromium, vanadium, aluminum, molybdenum, niobium, tungsten, zirconium, hafnium or alloys ofthese metals. The ceramic layer is a nitride, carbonitride, carbide, oxycarbide or oxynitride of one or an alloy of the above metals. The substrate surface is optionally ion nitride prior to the vapour deposition of the metal—ceramic layers. The substrate bearing pairs of metal—ceramic layers may be subsequently heat treated. The obtained coating on a metal substrate exhibits high wear resistance and hardness and low surface roughness.

Abstract: A vapour deposited coating on the surface of a metal, such as a stainless steel substrate, obtained in a plasma vapour depositing device having magnetic vapour stream filtering means. The vapour deposited coating comprises pairs of a metal layer and a ceramic metal compound (“ceramic”) layer. The metal layer deposited is one of titanium, chromium, vanadium, aluminum, molybdenum, niobium, tungsten, zirconium, hafnium or alloys ofthese metals. The ceramic layer is a nitride, carbonitride, carbide, oxycarbide or oxynitride of one or an alloy of the above metals. The substrate surface is optionally ion nitride prior to the vapour deposition of the metal - ceramic layers. The substrate bearing pairs of metal - ceramic layers may be subsequently heat treated. The obtained coating on a metal substrate exhibits high wear resistance and hardness and low surface roughness.