Abstract: A web material processing machine (10) for producing a multi-layered material (12), especially a multi-layered packaging material (13), is presented. It comprises a first vacuum coating unit (28) for deposing a film of a first coating material on a web material (16) to be processed. Moreover, it is equipped with an extrusion coating unit (32) for extruding a film of an extrusion material on the web material (16). The extrusion coating unit (32) is positioned behind the first vacuum coating unit (28) with respect to a processing direction (20). Additionally, a method for producing a multi-layered web material (12) is explained. Furthermore, a multi-layered packaging material (13) is described.

Abstract: A dialysis system (10) comprising a dialysis machine (20) and a water purification system (30). The water purification system (30) comprising a pre-treatment system (10) and a primary treatment system (80). The water purification system (30) is provided within a portable unit (90) defining an enclosure. The dialysis machine (20) is removably provided on an upper surface of the enclosure of the portable unit (90).

Abstract: Apparatus for coating a substrate with a material in a chamber subject, during use, to substantial evacuation, which includes a coating station within the chamber for coating a substrate by sputtering and/or by evaporation; at least one treating station disposed in serial with the coating station and equipped with a plasma treater incorporating a plasma generator in sufficient proximity to the substrate to treat the substrate; a magnetic device for generating a magnetic field; at least one cylindrical electrode surrounding the magnetic device, the plasma treater incorporates a device for rotating the electrode about its longitudinal axis.

Abstract: Apparatus for coating a substrate with a material in a chamber subject, during use, to substantial evacuation, which includes a coating station within the chamber for coating a substrate by sputtering and/or by evaporation; at least one treating station disposed in serial with the coating station and equipped with a plasma treater incorporating a plasma generator in sufficient proximity to the substrate to treat the substrate; a magnetic device for generating a magnetic field; at least one cylindrical electrode surrounding the magnetic device, the plasma treater incorporates a device for rotating the electrode about its longitudinal axis.

Abstract: Apparatus for coating a substrate with a material in a chamber subject, during use, to substantial evacuation, which includes a coating station within the chamber for coating a substrate by sputtering and/or by evaporation; at least one treating station disposed in serial with the coating station and equipped with a plasma treater incorporating a plasma generator in sufficient proximity to the substrate to treat the substrate; a magnetic device for generating a magnetic field; at least one cylindrical electrode surrounding the magnetic device, the plasma treater incorporates a device for rotating the electrode about its longitudinal axis.