Patents by Inventor Nicholas E. Stacey

Nicholas E. Stacey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for fabricating patterned features utilizing imprint lithography
    Patent number: 7122482
    Abstract: One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.
    Type: Grant
    Filed: October 27, 2003
    Date of Patent: October 17, 2006
    Assignees: Molecular Imprints, Inc., University of Texas System
    Inventors: Frank Y. Xu, Nicholas E. Stacey, Michael P. C. Watts, Ecron D. Thompson