Patents by Inventor Nicholas J. Clecak

Nicholas J. Clecak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5322765
    Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
    Type: Grant
    Filed: November 22, 1991
    Date of Patent: June 21, 1994
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Willard E. Conley, Ranee W.-L. Kwong, Leo L. Linehan, Scott A. MacDonald, Harbans S. Sachdev, Hubert Schlosser, Carlton G. Willson
  • Patent number: 4601969
    Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
    Type: Grant
    Filed: March 28, 1985
    Date of Patent: July 22, 1986
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Barbara D. Grant, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson
  • Patent number: 4585310
    Abstract: The orientation of the alignment layer in a raster-scanned thermally addressed smectic liquid crystal display device can be chosen relative to the writing orientation to accentuate a selected characteristic. A perpendicular alignment with respect to the scan direction produces uniformly written images in both scan directions to allow high quality bidirectional writing. In a preferred embodiment the liquid crystal cell includes a liquid crystal material comprising 4-octyloxy-4'-cyanobiphenyl 37.5%, 4-decyl-4'-cyanobiphenyl 36.8% weight percent and 4-undecyl-4'-cyanobiphenyl 25.7 weight percent.
    Type: Grant
    Filed: December 12, 1983
    Date of Patent: April 29, 1986
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Robert J. Cox, Joseph S. Feng, Jerry Leff
  • Patent number: 4522911
    Abstract: A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
    Type: Grant
    Filed: June 28, 1983
    Date of Patent: June 11, 1985
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Dennis R. McKean, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson
  • Patent number: 4397937
    Abstract: Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
    Type: Grant
    Filed: February 10, 1982
    Date of Patent: August 9, 1983
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Dennis R. McKean, Robert D. Miller, Terry C. Tompkins, Robert J. Twieg, Carlton G. Willson
  • Patent number: 4339522
    Abstract: Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
    Type: Grant
    Filed: October 24, 1980
    Date of Patent: July 13, 1982
    Assignee: International Business Machines Corporation
    Inventors: Richard D. Balanson, Nicholas J. Clecak, Barbara D. Grant, Augustus C. Ouano
  • Patent number: 4284706
    Abstract: Lithographic resist compositions are provided which permit an improved lift-off process in which the deposition mask with apertures has the desirable negative slope or overhang. The resist composition comprises a phenolic-aldehyde resin, a photosensitizer and Meldrum's diazo, or Meldrum's acid or suitable analogs thereof as a profile modifying agent. The profile modifying agents useful in the present invention have the formula: ##STR1## wherein R.sub.1 is C.sub.1 to C.sub.20 alkyl or aryl, R.sub.2 is H, C.sub.1 to C.sub.20 alkyl or aryl, or together R.sub.1 and R.sub.2 are cycloalkyl, A is N or H.
    Type: Grant
    Filed: December 3, 1979
    Date of Patent: August 18, 1981
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Barbara D. Grant, Carlton G. Willson
  • Patent number: 4139276
    Abstract: Electrochromic display devices having very desirable stability and reversibility are obtained using as the oxidant certain fluorene compounds substituted with at least two alkoxy groups per molecule. The display device comprises a reactive medium between two electrically conductive electrodes at least one of which is transparent. The reactive medium comprises an anhydrous solvent and an oxidant/reductant pair.
    Type: Grant
    Filed: March 27, 1978
    Date of Patent: February 13, 1979
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Barbara D. Grant, Annette B. Jaffe, Gary S. Keller