Patents by Inventor Nicholas Martin van Heel

Nicholas Martin van Heel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7276775
    Abstract: Damascene or non-damascene processing when used with a method that includes (a) forming a mask having an opening therethrough on a structure, said opening having sidewalls; (b) implanting an inhibiting species into said structure through the opening so as to form an inhibiting region in said structure; and (c) growing a dielectric layer on the structure in said opening, wherein the inhibiting region partially inhibits growth of the dielectric layer is capable of forming a semiconductor structure, e.g., MOSFET or anti-fuse, including a dual thickness dielectric layer. Alternatively, the dual thickness dielectric can be formed by replacing the inhibiting species mentioned above with a dielectric growth enhancement species which forms an enhancing region in the structure which aids in the growth of the dielectric layer.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: October 2, 2007
    Assignee: International Business Machines Corporation
    Inventors: Claude Louis Bertin, Anthony J. Dally, John Atkinson Fifield, John Jesse Higgins, Jack Allan Mandelman, William Robert Tonti, Nicholas Martin van Heel
  • Publication number: 20030109090
    Abstract: Damascene or non-damascene processing when used with a method that includes (a) forming a mask having an opening therethrough on a structure, said opening having sidewalls; (b) implanting an inhibiting species into said structure through the opening so as to form an inhibiting region in said structure; and (c) growing a dielectric layer on the structure in said opening, wherein the inhibiting region partially inhibits growth of the dielectric layer is capable of forming a semiconductor structure, e.g., MOSFET or anti-fuse, including a dual thickness dielectric layer. Alternatively, the dual thickness dielectric can be formed by replacing the inhibiting species mentioned above with a dielectric growth enhancement species which forms an enhancing region in the structure which aids in the growth of the dielectric layer.
    Type: Application
    Filed: December 26, 2002
    Publication date: June 12, 2003
    Applicant: International Business Machines Corporation
    Inventors: Claude Louis Bertin, Anthony J. Dally, John Atkinson Fifield, John Jesse Higgins, Jack Allan Mandelman, William Robert Tonti, Nicholas Martin van Heel
  • Patent number: 6570806
    Abstract: A universal fuse latch device includes a latch circuit receiving an electrical signal for initializing the latch circuit to a first state; one or more legs connected at the latch node, with a first leg implementing a fuse type element capable of transitioning the latch from the first state to a second state; and a second leg including an anti-fuse type element, wherein the fuse latch is provided with a fuse resistance trip point to ensure adequate reading of one of the fuse and anti-fuse type elements. The universal fuse latch device may be part of a programmable fuse bank including a plurality of information fuse latches for storing redundancy information in a memory system and capable of being simultaneously interrogated. A master fuse control device comprising the universal fuse latch circuit is programmed in accordance with a priority of legs to be interrogated in the information fuse latches.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: May 27, 2003
    Assignee: International Business Machines Corporation
    Inventors: Claude Louis Bertin, John Atkinson Fifield, Nicholas Martin Van Heel, Jason Timothy Varricchione
  • Patent number: 6531410
    Abstract: Damascene or non-damascene processing when used with a method that includes (a) forming a mask having an opening therethrough on a structure, said opening having sidewalls; (b) implanting an inhibiting species into said structure through the opening so as to form an inhibiting region in said structure; and (c) growing a dielectric layer on the structure in said opening, wherein the inhibiting region partially inhibits growth of the dielectric layer is capable of forming a semiconductor structure, e.g., MOSFET or anti-fuse, including a dual thickness dielectric layer. Alternatively, the dual thickness dielectric can be formed by replacing the inhibiting species mentioned above with a dielectric growth enhancement species which forms an enhancing region in the structure which aids in the growth of the dielectric layer.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: March 11, 2003
    Assignee: International Business Machines Corporation
    Inventors: Claude Louis Bertin, Anthony J. Dally, John Atkinson Fifield, John Jesse Higgins, Jack Allan Mandelman, William Robert Tonti, Nicholas Martin van Heel
  • Publication number: 20020196693
    Abstract: A universal fuse latch device comprises a latch circuit receiving a precharge signal and latching the precharge signal at a latch node thereof for initializing the latch to a first state; and one or more legs connected at the latch node, with a first leg implementing a fuse type element capable of transitioning the latch from the first state to a second state, and a second leg including an anti-fuse type element, wherein the fuse latch is provided with a fuse resistance trip point to ensure adequate programming of one of the fuse and anti-fuse type element. In one application, the universal fuse latch device is implemented as part of a programmable fuse bank comprising a plurality of information fuse latches for storing redundancy information in a memory system and capable of being simultaneously interrogated. A master fuse control device comprising the universal fuse latch circuit is provided that is programmed in accordance with a priority of legs to be interrogated in the information fuse latches.
    Type: Application
    Filed: June 25, 2001
    Publication date: December 26, 2002
    Applicant: International Business Machines Corporation
    Inventors: Claude Louis Bertin, John Atkinson, Nicholas Martin Van Heel, Jason Timothy Varricchione
  • Publication number: 20020119637
    Abstract: Damascene or non-damascene processing when used with a method that includes (a) forming a mask having an opening therethrough on a structure, said opening having sidewalls; (b) implanting an inhibiting species into said structure through the opening so as to form an inhibiting region in said structure; and (c) growing a dielectric layer on the structure in said opening, wherein the inhibiting region partially inhibits growth of the dielectric layer is capable of forming a semiconductor structure, e.g., MOSFET or anti-fuse, including a dual thickness dielectric layer. Alternatively, the dual thickness dielectric can be formed by replacing the inhibiting species mentioned above with a dielectric growth enhancement species which forms an enhancing region in the structure which aids in the growth of the dielectric layer.
    Type: Application
    Filed: February 27, 2001
    Publication date: August 29, 2002
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Claude Louis Bertin, Anthony J. Dally, John Atkinson Fifield, John Jesse Higgins, Jack Allan Mandelman, William Robert Tonti, Nicholas Martin van Heel
  • Patent number: 6339559
    Abstract: Described is an antifuse array comprising a plurality of antifuse elements and a plurality of cell plates. Each of the antifuse elements comprises a programming transistor and one of the cell plates. The programming transistor and the cell plate of each antifuse element are both activated to program the antifuse element. Each of the cell plates is coupled to a portion of the plurality of antifuse elements and to one of a plurality of decode circuits, and the decode circuits selectively activate its coupled cell plate. With a preferred embodiment, a multitude of interconnect lines are connected to the antifuses and in particular, each interconnect line intersects each of the cell plates and is associated with one antifuse in each group of antifuses. With this preferred embodiment, the array of antifuses are decoded by predecoding one of the cell plates by elevating the cell plate voltage from ground to a program voltage, and decoding one of the interconnect lines to program one of the antifuses.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: January 15, 2002
    Assignee: International Business Machines Corporation
    Inventors: Claude Louis Bertin, John Atkinson Fifield, Nicholas Martin van Heel