Patents by Inventor Nicholas P. DESKEVICH

Nicholas P. DESKEVICH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240117495
    Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.
    Type: Application
    Filed: October 13, 2020
    Publication date: April 11, 2024
    Inventors: Geoffrey K. WHITE, Nicholas P. DESKEVICH, James B. MATTZELA, Gary A. BARONE, David A. SMITH, Pierre A. LECLAIR, Min YUAN, Jesse BISCHOF
  • Publication number: 20170335451
    Abstract: Static thermal chemical vapor deposition treatment processes and static thermal chemical vapor deposition treatment systems are disclosed. The process includes providing an enclosed chamber configured to produce a material on a surface of an article within the enclosed chamber in response thermal energy being applied to a gaseous precursor, providing a liquid handling system in selective fluid communication with the enclosed chamber, flowing a liquid precursor through the liquid handling system, converting the liquid precursor to the gaseous precursor, and producing the material on the surface of the article in response to the thermal energy being applied to the gaseous precursor within the enclosed chamber. The system includes the enclosed chamber and the liquid handling system.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 23, 2017
    Inventors: Nicholas P. DESKEVICH, Pierre A. LECLAIR, David A. SMITH