Patents by Inventor Nicholas Peter WATERSON

Nicholas Peter WATERSON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11835870
    Abstract: A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: December 5, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Güneş Nak{dot over (i)}boğlu, Nicholas Peter Waterson, Remco Van De Meerendonk, Steve Gregory Brust, Dirk Martinus Gerardus Petrus Wilhelmus Jakobs, Shravan Kottapalli
  • Publication number: 20220350265
    Abstract: A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.
    Type: Application
    Filed: June 18, 2020
    Publication date: November 3, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Günes NAKIBOGLU, Nicholas Peter WATERSON, Remco VAN DE MEERENDONK, Steve Gregory BRUST, Dirk Martinus Gerardus Petrus Wilhelmus JAKOBS, Shravan KOTTAPALLI
  • Patent number: 11385547
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Grant
    Filed: May 21, 2020
    Date of Patent: July 12, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
  • Patent number: 10877384
    Abstract: An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device (20) arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element (21) having a first fluid channel (215) arranged therein, the first shield element having a first surface (213) and a second surface (214), the first surface being arranged closer to the radiative element than the second surface; and a second shield element (22) having a second fluid channel (225) arranged therein, the second shield element having a third surface (223) and a fourth surface (224), the third surface being arranged closer to the radiative element than the fourth surface.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: December 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph Janssen, Philippe Jacqueline Johannes Hubertus Anthonius Habets, Güneş Nakiboğlu, Roger Wilhelmus Antonius Henricus Schmitz, Remco Van de Meerendonk, Joris Dominicus Bastiaan Johannes Van den Boom, Nicholas Peter Waterson
  • Publication number: 20200401058
    Abstract: An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device (20) arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element (21) having a first fluid channel (215) arranged therein, the first shield element having a first surface (213) and a second surface (214), the first surface being arranged closer to the radiative element than the second surface; and a second shield element (22) having a second fluid channel (225) arranged therein, the second shield element having a third surface (223) and a fourth surface (224), the third surface being arranged closer to the radiative element than the fourth surface.
    Type: Application
    Filed: February 21, 2019
    Publication date: December 24, 2020
    Inventors: Franciscus Johannes Joseph Janssen, Philippe Jacqueline Johannes Hubertus Anthonius Habets, Günes Nakiboglu, Roger Wilhelmus Antonius Henricus Schmitz, Remco Van de Meerendonk, Joris Dominicus Bastiaan Johannes Van den Boom, Nicholas Peter Waterson
  • Publication number: 20200285154
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Application
    Filed: May 21, 2020
    Publication date: September 10, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
  • Patent number: 10705426
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
  • Publication number: 20190163066
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Application
    Filed: April 5, 2017
    Publication date: May 30, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET