Patents by Inventor Nicholas Pinto

Nicholas Pinto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10067080
    Abstract: A nanostructure device is provided and performs dual functions as a nano-switching/sensing device. The nanostructure device includes a doped semiconducting substrate, an insulating layer disposed on the doped semiconducting substrate, an electrode formed on the insulating layer, and at least one polymer nanofiber deposited on the electrode. The at least one polymer nanofiber provides an electrical connection between the electrode and the substrate and is the electroactive element in the device.
    Type: Grant
    Filed: July 20, 2017
    Date of Patent: September 4, 2018
    Assignee: The United States of America as Represented by the Administrator of National Aeronautics and Space Administration
    Inventors: Felix A. Miranda, Onoufrios Theofylaktos, Nicholas Pinto, Carl H. Mueller, Javier Santos-Perez, Michael A. Meador
  • Patent number: 9753001
    Abstract: A nanostructure device is provided and performs dual functions as a nano-switching/sensing device. The nanostructure device includes a doped semiconducting substrate, an insulating layer disposed on the doped semiconducting substrate, an electrode formed on the insulating layer, and at least one polymer nanofiber deposited on the electrode. The at least one polymer nanofiber provides an electrical connection between the electrode and the substrate and is the electroactive element in the device.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: September 5, 2017
    Assignee: The United States of America as Represented by the Administrator of National Aeronautics and Space Administration
    Inventors: Felix A. Miranda, Onoufrios Theofylaktos, Nicholas Pinto, Carl H. Mueller, Javier Santos-Perez, Michael A. Meador
  • Patent number: 6067999
    Abstract: A method of cleaning a deposition tool to control and minimize emission of environmentally deleterious materials includes the steps of: a) establishing a predetermined temperature in a processing chamber; b) providing a mixture of between 15 and 25 percent nitrogen trifluoride in helium at a mixture flow rate of more than 550 standard cubic centimeters per minute (sccm); c) establishing a high pressure of 1.5 to 9.5 torr in the processing chamber; d) establishing a plasma in the processing chamber, e) establishing a low pressure in the processing chamber of 2 torr or less; and f) establishing a plasma in the processing chamber. Instead of a two-step cleaning method, the method may alternatively be executed as a one-step cleaning method. Either method may be optimized by, among other things, providing 19% nitrogen trifluoride. The two-step method may also be optimized by providing a high pressure of about 7 to 9.5 torr and a low pressure of about 1.5 torr.
    Type: Grant
    Filed: April 23, 1998
    Date of Patent: May 30, 2000
    Assignee: International Business Machines Corporation
    Inventors: Cynthia Marie Hines, James Nicholas Pinto