Abstract: The invention relates to a method for producing MoO2Cl2 under inert conditions, comprising the steps of: (i) charging a reaction vessel with MoO2, (ii) reacting the MoO2 with supplied Cl2 in the reaction vessel at a first temperature T1 to give gaseous MoO2Cl2, (iii) transferring the gaseous MoO2Cl2 into a receiving vessel, (iv) resublimating the gaseous MoO2Cl2 in the receiving vessel to give solid MoO2Cl2 at a second temperature T2 that is lower than T1, and (v) recovering solid MoO2Cl2 with a purity determined by ICP-OES/MS of 99.9996 wt. % or more. The invention also relates to high-purity MoO2Cl2, the use thereof, and electronic components.

Abstract: The invention concerns a process for preparing an essentially silicon (Si) free compounds of the general formula [M(O)(OR)y], wherein M = Mo, y = 3 or M = W, y = 3 or 4. Furthermore, it is directed towards compounds obtained by the aforementioned process and towards the use of such an obtained compound. Another objective of the herein described invention are essentially silicon free compounds of the general formula MOXy or [MOXy(solv)p], prepared using the aforementioned process, wherein M = Mo, y = 3 or M = W, y = 3 or 4, X = Cl or Br, solv = an oxidizing agent Z binding or coordinating to M via at least one donor atom, p = 1 or 2.

Abstract: The invention relates to a one-pot method for preparing oxido (tetraalkoxido) tungsten compounds according to the general formula [W(O)(OR)4] (I), originating from WCl6, hexamethyldisiloxane, an alcohol ROH and an amine or NH3 gas. The invention further relates to the use of a compounds [W(O)(OR)4] (I) and to a substrate which has on one surface a tungsten layer or a layer containing tungsten which are suitable for producing photovoltaic elements, semiconductor elements or car exhaust catalytic converters. The method permits the preparation of defined products in a simple, cost-effective and reproducible manner in high purity and good to very good yields.

Abstract: The invention relates to compounds in accordance with the general formula [Ru(arene)(Ra—N?CR1—CR3?N—Rb)] or [Ru(arene)((Rc,Rd)N—N?CRH1—CRH3?N—N(Re,Rf))]. In this case, arene is selected from the group consisting of mononuclear and polynuclear arenes and heteroarenes. R1, R3, RH1, RH3 and Ra-Rf are independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl radical. It further relates to methods for the production of these compounds, compounds obtainable according to these methods, their use and a substrate having on a surface thereof a ruthenium layer or a layer containing ruthenium. In addition, the invention relates to a method for producing compounds [Ru(arene)X2]2, wherein arene is selected from the group consisting of mononuclear and polynuclear arenes and X=halogen, compounds of this type obtainable according to this method, and their use.

Abstract: Metal complexes of formula (I) are described: [M(L1)x(L2)y(hydra)z]n??formula (I) wherein: M=metal atom having an atomic number selected from the ranges a) through c): a) 12, 21 to 34, with the exception of 30, b) 39 to 52, with the exception of 48, c) 71 to 83, with the exception of 80, L1=neutral or anionic ligand, with x=0 or 1, L2=neutral or anionic ligand, with y=0 or 1, (hydra)=acetone dimethylhydrazone monoanion, with z=1, 2, or 3, n=1 or 2, and the total charge of the complex is 0.

Abstract: The invention relates to compounds in accordance with the general formula [Ru(arene)(Ra—N?CR1—CR3?N—Rb)] or [Ru(arene)((Rc,Rd)N—N?CRH1—CRH3?N—N(Re,Rf))]. In this case, arene is selected from the group consisting of mononuclear and polynuclear arenes and heteroarenes. R1, R3, RH1, RH3 and Ra-Rf are independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl radical. It further relates to methods for the production of these compounds, compounds obtainable according to these methods, their use and a substrate having on a surface thereof a ruthenium layer or a layer containing ruthenium. In addition, the invention relates to a method for producing compounds [Ru(arene)X2]2, wherein arene is selected from the group consisting of mononuclear and polynuclear arenes and X=halogen, compounds of this type obtainable according to this method, and their use.

Abstract: The invention relates to the synthesis and provision of a new class of volatile metal organic compounds based on bis(alkylimine)glyoxal and bis(dialkylhydrazone)glyoxal ligands in combination with cyclopentadienide and alkyl ligands for use in ALD and CVD processes.