Abstract: A method is provided for rendering a scene including a digital three-dimensional (3D) model of a structure. The method includes traversing a scene graph composed of a hierarchical group of nodes representing respective 3D objects of the digital 3D model, and selecting nodes of the hierarchical group of nodes. The method includes adding a plurality of objects represented by the selected nodes to a render queue, performing a multiple-pass rendering of the plurality of 3D objects from the render queue. This includes in a pass of a plurality of passes, rendering a threshold portion but not all of the plurality of 3D objects to a framebuffer for output to a display device, with at least one of the plurality of 3D objects being left in the render queue after rendering the threshold portion. The method may also include a mesh simplification and/or z-occlusion.

Abstract: A method is provided for rendering a scene including a digital three-dimensional (3D) model of a structure. The method includes traversing a scene graph composed of a hierarchical group of nodes representing respective 3D objects of the digital 3D model, and selecting nodes of the hierarchical group of nodes. The method includes adding a plurality of objects represented by the selected nodes to a render queue, performing a multiple-pass rendering of the plurality of 3D objects from the render queue. This includes in a pass of a plurality of passes, rendering a threshold portion but not all of the plurality of 3D objects to a framebuffer for output to a display device, with at least one of the plurality of 3D objects being left in the render queue after rendering the threshold portion. The method may also include a mesh simplification and/or z-occlusion.

Abstract: A ClF3 gas generation system is provided with supply sources of chlorine (3) (for example a cylinder of compressed chlorine) and fluorine (4) (for example a fluorine generator) connected into a gas reaction chamber (2) enabling generation of ClF3 gas. The reaction chamber has a valved outlet (C) for the supply of the ClF3 gas to a process chamber for immediate local use.

Abstract: A substrate is treated by supplying an etchant and/or deposition gas into a chamber in which the substrate is situated. In order to avoid the problems associated with transportation of toxic gases, the gases required for such processes are delivered directly from a gas generation and delivery system positioned locally to the chamber.