Abstract: A method is provided for rendering a scene including a digital three-dimensional (3D) model of a structure. The method includes traversing a scene graph composed of a hierarchical group of nodes representing respective 3D objects of the digital 3D model, and selecting nodes of the hierarchical group of nodes. The method includes adding a plurality of objects represented by the selected nodes to a render queue, performing a multiple-pass rendering of the plurality of 3D objects from the render queue. This includes in a pass of a plurality of passes, rendering a threshold portion but not all of the plurality of 3D objects to a framebuffer for output to a display device, with at least one of the plurality of 3D objects being left in the render queue after rendering the threshold portion. The method may also include a mesh simplification and/or z-occlusion.

Abstract: The invention discloses a light emitter, comprising: a transparent semiconductor substrate; an epitaxial layer of a light emitting diode formed on a first side of the transparent semiconductor device; and a convex optical structure formed on the second side of the substrate opposite to the light emitting diode, wherein the convex optical structure is adapted to reflect and collimate light passing through the substrate; wherein light emitted from the light emitting diode passes through the substrate, is reflected by the convex optical structure, passes again through the transparent optical substrate and is emitted by the first side of the substrate. The convex optical structure may be fabricated by laser ablation.

Abstract: A method is provided for rendering a scene including a digital three-dimensional (3D) model of a structure. The method includes traversing a scene graph composed of a hierarchical group of nodes representing respective 3D objects of the digital 3D model, and selecting nodes of the hierarchical group of nodes. The method includes adding a plurality of objects represented by the selected nodes to a render queue, performing a multiple-pass rendering of the plurality of 3D objects from the render queue. This includes in a pass of a plurality of passes, rendering a threshold portion but not all of the plurality of 3D objects to a framebuffer for output to a display device, with at least one of the plurality of 3D objects being left in the render queue after rendering the threshold portion. The method may also include a mesh simplification and/or z-occlusion.

Abstract: A submount for a micro-component includes a semiconductor substrate having a cavity defined in a front-side of the substrate in which to mount the micro-component. The submount also includes a thin silicon membrane portion at a bottom of the cavity and thicker frame portions adjacent to sidewalls of the cavity. The substrate includes an electrically conductive feed-through connection extending from a back-side of the substrate at least partially through the thicker silicon frame portion. Electrical contact between the feed-through connection and a conductive layer on a surface of the cavity is made at least partially through a sidewall of the cavity.

Abstract: A ClF3 gas generation system is provided with supply sources of chlorine (3) (for example a cylinder of compressed chlorine) and fluorine (4) (for example a fluorine generator) connected into a gas reaction chamber (2) enabling generation of ClF3 gas. The reaction chamber has a valved outlet (C) for the supply of the ClF3 gas to a process chamber for immediate local use.

Abstract: A substrate is treated by supplying an etchant and/or deposition gas into a chamber in which the substrate is situated. In order to avoid the problems associated with transportation of toxic gases, the gases required for such processes are delivered directly from a gas generation and delivery system positioned locally to the chamber.