Patents by Inventor Nick J. Visovsky

Nick J. Visovsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating an integrated optical isolator and a novel wire grid structure
    Patent number: 6813077
    Abstract: A method for fabricating an integrated optical isolator includes depositing a wire grid material on a magneto-optical substrate and depositing a resist film on the wire grid material. The method further includes bringing a mold with a wire grid pattern on contact with the resist film and compressing the mold and resist film together so as to emboss the wire grid pattern in the resist film. The method further includes transferring the wire grid pattern in the resist film to the wire grid material on the magneto-optical substrate by etching.
    Type: Grant
    Filed: June 19, 2001
    Date of Patent: November 2, 2004
    Assignee: Corning Incorporated
    Inventors: Nicholas F. Borrelli, David G. Grossman, Kenjro Hasui, Tamio Kosaka, Nick J. Visovsky
  • Method for fabricating an integrated optical isolator and a novel wire grid structure
    Publication number: 20020191880
    Abstract: A method for fabricating an integrated optical isolator includes depositing a wire grid material on a magneto-optical substrate and depositing a resist film on the wire grid material. The method further includes bringing a mold with a wire grid pattern on contact with the resist film and compressing the mold and resist film together so as to emboss the wire grid pattern in the resist film. The method further includes transferring the wire grid pattern in the resist film to the wire grid material on the magneto-optical substrate by etching.
    Type: Application
    Filed: June 19, 2001
    Publication date: December 19, 2002
    Inventors: Nicholas F. Borrelli, David G. Grossman, Kenjro Hasui, Tamio Kosaka, Nick J. Visovsky
  • Replicating a nanoscale pattern
    Patent number: 6375870
    Abstract: A method of replicating a nanoscale pattern which comprises forming the pattern on the outer surface of a cylindrical roller, providing a surface upon which the pattern is to be replicated, and transferring the nanoscale pattern from the cylindrical roller onto the surface to provide at least one replication of the pattern on that surface. The roller is adapted to carry the pattern on its outer surface and transfer the pattern to a substrate. The ultimate product may be a grating polarizer.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: April 23, 2002
    Assignee: Corning Incorporated
    Inventors: Nick J. Visovsky, David D. Wang