Patents by Inventor Nick Pugliano

Nick Pugliano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymers, processes for polymer synthesis and photoresist compositions
    Patent number: 7208261
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Grant
    Filed: April 5, 2004
    Date of Patent: April 24, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
  • Polymers, processes for polymer synthesis and photoresist compositions
    Patent number: 6841331
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: January 11, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
  • Novel polymers, processes for polymer synthesis and photoresist compositions
    Publication number: 20040259025
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Application
    Filed: April 5, 2004
    Publication date: December 23, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
  • Novel polymers, processes for polymer synthesis and photoresist compositions
    Publication number: 20030027075
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Application
    Filed: February 26, 2002
    Publication date: February 6, 2003
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano