Patents by Inventor Nickhil H. Jakatdar

Nickhil H. Jakatdar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND APPARATUS FOR THE DETERMINATION OF MASK RULES USING SCATTEROMETRY
    Publication number: 20020131055
    Abstract: A method and apparatus for determining optical mask corrections for photolithography. A plurality of grating patterns is printed onto a wafer utilizing a photomask having at least one grating. Each grating pattern within the plurality of grating patterns is associated with known photolithographic settings. Each grating pattern is illuminated independently with a light source, so that light is diffracted off each grating pattern. The diffracted light is measured utilizing scatterometry techniques to determine measured diffracted values. The measured diffracted values are compared to values in a library to determine a profile match. A 2-dimensional profile description is assigned to each grating pattern based on the profile match. A database is compiled of the profile descriptions for the plurality of grating patterns. Photomask design rules are then generated by accessing the database containing the 2-dimensional profile descriptions.
    Type: Application
    Filed: January 29, 2001
    Publication date: September 19, 2002
    Inventors: Xinhui Niu, Nickhil H. Jakatdar
  • Method and apparatus for the determination of mask rules using scatterometry
    Patent number: 6433878
    Abstract: A method and apparatus for determining optical mask corrections for photolithography. A plurality of grating patterns is printed onto a wafer utilizing a photomask having at least one grating. Each grating pattern within the plurality of grating patterns is associated with known photolithographic settings. Each grating pattern is illuminated independently with a light source, so that light is diffracted off each grating pattern. The diffracted light is measured utilizing scatterometry techniques to determine measured diffracted values. The measured diffracted values are compared to values in a library to determine a profile match. A 2-dimensional profile description is assigned to each grating pattern based on the profile match. A database is compiled of the profile descriptions for the plurality of grating patterns. Photomask design rules are then generated by accessing the database containing the 2-dimensional profile descriptions.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: August 13, 2002
    Assignee: Timbre Technology, Inc.
    Inventors: Xinhui Niu, Nickhil H. Jakatdar