Abstract: A dynamic memory structure is disclosed. The dynamic memory structure includes: a substrate; a first strip semiconductor material disposed on the substrate and extending along a first direction; a gate standing astride the first strip semiconductor material, extending along a second direction and dividing the first strip semiconductor material into a first source terminal, a first drain terminal and a first channel region; a first dielectric layer sandwiched between the gate and the first strip semiconductor material; a first capacitor unit disposed on the substrate and comprising the first source terminal serving as a bottom electrode, a second dielectric layer covering the first source terminal to serve as a capacitor dielectric layer and a capacitor metal layer covering the second dielectric layer to serve as a top electrode. Preferably, the first source terminal and the first drain terminal have asymmetric shapes.

Abstract: A dynamic memory structure is disclosed. The dynamic memory structure includes: a substrate; a first strip semiconductor material disposed on the substrate and extending along a first direction; a gate standing astride the first strip semiconductor material, extending along a second direction and dividing the first strip semiconductor material into a first source terminal, a first drain terminal and a first channel region; a first dielectric layer sandwiched between the gate and the first strip semiconductor material; a first capacitor unit disposed on the substrate and comprising the first source terminal serving as a bottom electrode, a second dielectric layer covering the first source terminal to serve as a capacitor dielectric layer and a capacitor metal layer covering the second dielectric layer to serve as a top electrode. Preferably, the first source terminal and the first drain terminal have asymmetric shapes.

Abstract: A dynamic memory structure is disclosed. The dynamic memory structure includes: a substrate; a first strip semiconductor material disposed on the substrate and extending along a first direction; a gate standing astride the first strip semiconductor material, extending along a second direction and dividing the first strip semiconductor material into a first source terminal, a first drain terminal and a first channel region; a first dielectric layer sandwiched between the gate and the first strip semiconductor material; a first capacitor unit disposed on the substrate and comprising the first source terminal serving as a bottom electrode, a second dielectric layer covering the first source terminal to serve as a capacitor dielectric layer and a capacitor metal layer covering the second dielectric layer to serve as a top electrode. Preferably, the first source terminal and the first drain terminal have asymmetric shapes.

Abstract: A dynamic memory structure is disclosed. The dynamic memory structure includes: a substrate; a first strip semiconductor material disposed on the substrate and extending along a first direction; a gate standing astride the first strip semiconductor material, extending along a second direction and dividing the first strip semiconductor material into a first source terminal, a first drain terminal and a first channel region; a first dielectric layer sandwiched between the gate and the first strip semiconductor material; a first capacitor unit disposed on the substrate and comprising the first source terminal serving as a bottom electrode, a second dielectric layer covering the first source terminal to serve as a capacitor dielectric layer and a capacitor metal layer covering the second dielectric layer to serve as a top electrode. Preferably, the first source terminal and the first drain terminal have asymmetric shapes.

Abstract: A dynamic memory structure is disclosed. The dynamic memory structure includes: a substrate; a first strip semiconductor material disposed on the substrate and extending along a first direction; a gate standing astride the first strip semiconductor material, extending along a second direction and dividing the first strip semiconductor material into a first source terminal, a first drain terminal and a first channel region; a first dielectric layer sandwiched between the gate and the first strip semiconductor material; a first capacitor unit disposed on the substrate and comprising the first source terminal serving as a bottom electrode, a second dielectric layer covering the first source terminal to serve as a capacitor dielectric layer and a capacitor metal layer covering the second dielectric layer to serve as a top electrode. Preferably, the first source terminal and the first drain terminal have asymmetric shapes.

Abstract: A high speed memory chip module includes a type of memory cell array group and a logic unit. The type memory cell array group includes multiple memory cell array integrated circuits (ICs), and each of the memory cell array ICs has a data bus and at least one memory cell array, and corresponds to first metal-oxide-semiconductor field-effect transistor (MOSFET) gate length corresponding to a first MOSFET process. The logic unit accesses the type of memory cell array group through a first transmission bus, where bus width of the first transmission bus is wider than bus width of the data bus of each of the memory cell array ICs. Corresponding to a second MOSFET process, the logic unit has a second MOSFET gate length which is shorter than the first MOSFET gate length.

Abstract: A dynamic memory structure is disclosed. The dynamic memory structure includes: a substrate; a first strip semiconductor material disposed on the substrate and extending along a first direction; a gate standing astride the first strip semiconductor material, extending along a second direction and dividing the first strip semiconductor material into a first source terminal, a first drain terminal and a first channel region; a first dielectric layer sandwiched between the gate and the first strip semiconductor material; a first capacitor unit disposed on the substrate and comprising the first source terminal serving as a bottom electrode, a second dielectric layer covering the first source terminal to serve as a capacitor dielectric layer and a capacitor metal layer covering the second dielectric layer to serve as a top electrode. Preferably, the first source terminal and the first drain terminal have asymmetric shapes.

Abstract: A dynamic memory structure includes a strip semiconductor material disposed on a substrate, a gate standing astride the strip semiconductor material and dividing the strip semiconductor material into a source terminal, a drain terminal and a channel region wherein a source width of the source terminal is larger than or equal to a channel width, a dielectric layer sandwiched between the gate and the strip semiconductor material, and a capacitor unit disposed on the substrate and including the source terminal serving as a lower electrode.

Abstract: A dynamic memory structure includes a strip semiconductor material disposed on a substrate, a gate standing astride the strip semiconductor material and dividing the strip semiconductor material into a source terminal, a drain terminal and a channel region wherein a source width of the source terminal is larger than or equal to a channel width, a dielectric layer sandwiched between the gate and the strip semiconductor material, and a capacitor unit disposed on the substrate and including the source terminal serving as a lower electrode.

Abstract: A process for fabricating a capacitor over bitline, DRAM device, using a self-aligned contact opening, through, and between the bitline structures, and featuring the formation of insulator spacers, on the sidewall of the bitline structures, formed after the opening of the self-aligned contact, has been developed. The self-aligned contact opening, located through the bitline structures, allows an increase in DRAM cell density to be achieved. The formation of insulator spacers, on the sidewall of the bitline structures, formed after the opening of the self-aligned contact, in a silicon oxide layer, allows silicon oxide to be used as the spacer material, thus resulting in capacitance decrease when compared to counterparts fabricated using silicon nitride spacers.