Patents by Inventor Nicola Pugliano

Nicola Pugliano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050141839
    Abstract: Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether, and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
    Type: Application
    Filed: November 19, 2004
    Publication date: June 30, 2005
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: James Shelnut, Nicola Pugliano, Matthew Moynihan, Hai Zheng, Daniel Lundy, Nathan Pawlowski
  • Publication number: 20050123862
    Abstract: Provided are methods of forming optical components. The methods involves (a) forming over a substrate a layer of a photoimageable composition that includes a hybrid organic-inorganic polymer and a photoactive component, wherein the layer has a first index of refraction and a first dissolution rate; and (b) exposing by multi-photon absorption using actinic radiation a predefined volume of the layer. The volume is caused to have: (i) a second index of refraction which is different than the first index of refraction and/or (ii) a second dissolution rate which is different than the first dissolution rate. The methods have particular applicability in the formation of optical waveguides and other optical components.
    Type: Application
    Filed: September 13, 2004
    Publication date: June 9, 2005
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: Nicola Pugliano, Craig Allen
  • Publication number: 20030235785
    Abstract: New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 run. Resists of the invention provide contrast between exposed and unexposed coating layer regions through crosslinking or other solubility switching mechanism. Preferred resists of the invention include a resin component that contains repeat units that facilitate aqueous base solubility.
    Type: Application
    Filed: March 4, 2003
    Publication date: December 25, 2003
    Inventors: George G. Barclay, Nicola Pugliano