Abstract: A method for activation of CdTe films used in CdTe/CdS type thin film solar cells is described, in which a CdTe film is treated with a mixture formed by a fluorine-free chlorinated hydrocarbon and a gaseous chlorine-free fluorinated hydrocarbon. The fluorine-free chlorinated hydrocarbon and the gaseous chlorine-free fluorinated hydrocarbon are harmless to the ozone layer.

Abstract: A method of forming a non-rectifying, ohmic contact on a p-type semiconductor CdTe thin film, which comprises the steps of depositing a layer of As2Te3 on a CdTe layer at a substrate temperature generally within a range of ambient temperature and 200° C.; depositing a layer of Cu on the As2Te3 layer; and bringing at least the deposited Cu layer to a temperature generally within a range of 150° C. and 250° C. The method is used to form a stable contact on CdTe/CdS thin film solar cells.

Abstract: A process for large-scale production of CdTe/CdS thin film solar cell the films of the solar cells being deposited as a sequence on a transparent substrate, which comprises the steps of: depositing a film of a transparent conductive oxide (TCO) on the substrate; depositing a film of CdS on the TCO film; treating the CdTe film with Chlorine-containing inert gas; and depositing a back-contact film on the treated CdTe film. The Chlorine-containing inert gas is a Chlorofluorocarbon or a Hydrochlorofluorocarbon product and the treatment is carried out in a vacuum chamber at an operating temperature of 380-420° C. The Chlorine released as a result of the thermal dissociation of the product reacts with solid CdTe present on the cell surface to produce TeCl2 and CdCl2 vapors. Any residual CdCl2 is removed from the cell surface by applying a vacuum to the vacuum chamber while keeping the temperature at the operating value.

Abstract: A process for large-scale production of CdTe/CdS thin film solar cells, films of the cells being deposited, in sequence, on a transparent substrate, the sequence comprising the steps of: depositing a film of a transparent conductive oxide (TCO) on the substrate; depositing a film of CdS on the TCO film; depositing a film of CdTe on the CdS film; treating the CdTe film with CdCl2; depositing a back-contact film on the treated CdTe film. Treatment of the CdTe film with CdCl2 comprises the steps of: forming a layer of CdCl2 on the CdTe film by evaporation, while maintaining the substrate at room temperature; annealing the CdCl2 layer in a vacuum chamber at a temperature generally within a range of 380° C. and 420° C. and a pressure generally within a range of 300 mbar and 1000 mbar in an inert gas atmosphere; removing the inert gas from the chamber so as to produce a vacuum condition, while the substrate is kept at a temperature generally within a range of 350° C. and 420° C.

Abstract: A process for large-scale production of CdTe/CdS thin film solar cells, films of the cells being deposited, in sequences on a transparent substrate, the sequence comprising the steps of: depositing a film of a transparent conductive oxide (TCO) on the substrate; depositing a film of CdS on the TCO film; depositing a film of CdTe on the CdS film; treating the CdTe film with CdCl2; depositing a back-contact film on the treated CdTe film. Treatment of the CdTe film with CdCl2 comprises the steps of: forming a layer of CdCl2 on the CdTe film by evaporation, while maintaining the substrate at room temperature; annealing the CdCl2 layer in a vacuum chamber at a temperature generally within a range of 380° C. and 420° C. and a pressure generally within a range of 300 mbar and 1000 mbar in an inert gas atmosphere; removing the inert gas from the chamber so as to produce a vacuum condition, while the substrate is kept at a temperature generally within a range of 350° C. and 420° C.

Abstract: This relates to a thin film, multilayered device with a threshold voltage for electroluminescence less than 100v having good electro-optical characteristics. The layers comprise an amorphous support, on which a binary alloy layer, a luminescent layer, an insulating layer, and a conductor layer are deposited.