Abstract: A differential successive approximation analog to digital converter including: a comparator; a first plurality of capacitors coupled between a corresponding plurality of first switches and a first input of the comparator, at least one of the first capacitors being arranged to receive a first component of a differential input signal; and a second plurality of capacitors coupled between a corresponding plurality of second switches and a second input of the comparator, at least one of the second capacitors being arranged to receive a second component of the differential input signal, wherein each of the first and second plurality of switches are each adapted to independently couple the corresponding capacitor to a selected one of: a first supply voltage level; a second supply voltage level; and a third supply voltage level; and control circuitry adapted to sample the differential input voltage during a sample phase, and to control the first and second switches to couple each capacitor of the first and second plu

Abstract: A differential successive approximation analog to digital converter including: a comparator; a first plurality of capacitors coupled between a corresponding plurality of first switches and a first input of the comparator, at least one of the first capacitors being arranged to receive a first component of a differential input signal; and a second plurality of capacitors coupled between a corresponding plurality of second switches and a second input of the comparator, at least one of the second capacitors being arranged to receive a second component of the differential input signal, wherein each of the first and second plurality of switches are each adapted to independently couple the corresponding capacitor to a selected one of: a first supply voltage level; a second supply voltage level; and a third supply voltage level; and control circuitry adapted to sample the differential input voltage during a sample phase, and to control the first and second switches to couple each capacitor of the first and second plu

Abstract: A transistor has a cell array with two or more transistor cells, a temperature sensor, which is integrated in the cell array or is adjacent to the cell array, and an isolation structure. The isolation structure isolates the temperature sensor from the cell array, and has an isolation trench, which is arranged between the cell array and the temperature sensor. The distance between the temperature sensor and the active transistor cell that is closest to the temperature sensor corresponds approximately to the pitch between active transistor cells within the cell array.

Abstract: A transistor has a cell array with two or more transistor cells, a temperature sensor, which is integrated in the cell array or is adjacent to the cell array, and an isolation structure. The isolation structure isolates the temperature sensor from the cell array, and has an isolation trench, which is arranged between the cell array and the temperature sensor. The distance between the temperature sensor and the active transistor cell that is closest to the temperature sensor corresponds approximately to the pitch between active transistor cells within the cell array.

Abstract: The method of forming a semiconductor structure in a substrate comprises, forming a first trench with a first width We and a second trench with a second width Wc, wherein the first width We is larger than the second width Wc, depositing a protection material, lining the first trench, covering the substrate surface and filling the second trench and removing partially the protection material, wherein a lower portion of the second trench remains filled with the protection material.

Abstract: An electro static discharge device includes a semiconductor body. The semiconductor body includes a first surface, a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type arranged on the first semiconductor region and a third semiconductor region of the first conductivity type. The third semiconductor region is isolated from the first semiconductor region by the second semiconductor region. A resistor structure is arranged in the semiconductor body and comprises at least one trench structure. The resistor structure is arranged at least in the second semiconductor region and provides a high-resistance electrical connection between a first portion and a second portion of the second semiconductor region.

Abstract: The method of forming a semiconductor structure in a substrate comprises, forming a first trench with a first width We and a second trench with a second width Wc, wherein the first width We is larger than the second width Wc, depositing a protection material, lining the first trench, covering the substrate surface and filling the second trench and removing partially the protection material, wherein a lower portion of the second trench remains filled with the protection material.

Abstract: A method for fabricating a semiconductor structure having selective dopant regions in a semiconductor substrate having trenches formed therein I disclosed. In one embodiment, by a dopant source of an auxiliary structure, parts of the semiconductor structure which lie within the trenches are doped by means of a drive-in. In one embodiment, the semiconductor structure is patterned in planar regions outside the trenches and selectively doped by an implantation process.

Abstract: A method for fabricating a semiconductor structure having selective dopant regions in a semiconductor substrate having trenches formed therein I disclosed. In one embodiment, by a dopant source of an auxiliary structure, parts of the semiconductor structure which lie within the trenches are doped by means of a drive-in. In one embodiment, the semiconductor structure is patterned in planar regions outside the trenches and selectively doped by an implantation process.

Abstract: A transistor has a cell array with two or more transistor cells, a temperature sensor, which is integrated in the cell array or is adjacent to the cell array, and an isolation structure. The isolation structure isolates the temperature sensor from the cell array, and has an isolation trench, which is arranged between the cell array and the temperature sensor. The distance between the temperature sensor and the active transistor cell that is closest to the temperature sensor corresponds approximately to the pitch between active transistor cells within the cell array.