Patents by Inventor Nicolaas Cornelis Johannes Van Der Valk

Nicolaas Cornelis Johannes Van Der Valk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Refocusing device
    Patent number: 11499813
    Abstract: A focusing device comprises a base unit and a mirror unit which is translatable relative to the base unit parallel to an optical axis of the focusing device. The mirror unit is configured to receive incident light along the optical axis in a first direction and to reflect the incident light parallel with the optical axis in said first direction. The mirror unit comprises at least four mirrors, at least one of the mirrors being curved.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: November 15, 2022
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventor: Nicolaas Cornelis Johannes Van Der Valk
  • REFOCUSING DEVICE
    Publication number: 20200271435
    Abstract: A focusing device (1) comprises a base unit (12) and a mirror unit (11) which is translatable relative to the base unit parallel to an optical axis (A) of the focusing device. The minor unit (11) is configured to receive incident light along the optical axis (A) in a first direction and to reflect the incident light parallel with the optical axis (A) in said first direction. The minor unit (11) comprises at least four minors (21-24), at least one of the mirrors being curved.
    Type: Application
    Filed: October 9, 2018
    Publication date: August 27, 2020
    Inventor: Nicolaas Cornelis Johannes VAN DER VALK
  • SLM calibration
    Patent number: 8717535
    Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: May 6, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
  • SLM Calibration
    Publication number: 20090244506
    Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
    Type: Application
    Filed: December 22, 2008
    Publication date: October 1, 2009
    Applicant: ASML Netherlands B.V
    Inventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen