Patents by Inventor Nicolaas Johannes Van Asten

Nicolaas Johannes Van Asten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070139629
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 21, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Timotheus Sengers, Nicolaas Johannes Van Asten, Wilhelmus Box, Tjarko Van Empel, Leon Levasier, Erik Loopstra, Marcel Hubertus Muitjens, Luberthus Ouwehand, Leon Van Den Schoor, Marcel Beckers, Rob Jansen, Elke Van Loenhout