Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.

Abstract: A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

Abstract: An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.

Abstract: A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.

Abstract: A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.

Abstract: A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.

Abstract: A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and a meniscus is formed in a lower channel between the plate and the substrate.

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

Abstract: Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

Abstract: A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.

Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.