Patents by Inventor Nicolaas Petrus Marcus BRANTJES

Nicolaas Petrus Marcus BRANTJES has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for controlling a manufacturing process and associated apparatuses
    Patent number: 11947266
    Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: April 2, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Petrus Marcus Brantjes, Matthijs Cox, Boris Menchtchikov, Cyrus Emil Tabery, Youping Zhang, Yi Zou, Chenxi Lin, Yana Cheng, Simon Philip Spencer Hastings, Maxim Philippe Frederic Genin
  • SUBSTRATE SUPPORT AND SUBSTRATE TABLE
    Publication number: 20230075771
    Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.
    Type: Application
    Filed: January 25, 2021
    Publication date: March 9, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Coen Hubertus Matheus BALTIS, Nicolaas TEN KATE, Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN, Siegfried Alexander TROMP, Frank Pieter Albert VAN DEN BERKMORTEL, Niek Jacobus Johannes ROSET, Gijs KRAMER, Nicolaas Petrus Marcus BRANTJES, Michiel Theodorus Jacobus FONTEYN
  • METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES
    Publication number: 20220026810
    Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.
    Type: Application
    Filed: November 14, 2019
    Publication date: January 27, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Petrus Marcus BRANTJES, Matthijs COX, Boris MENCHTCHIKOV, Cyrus Emil TABERY, Youping ZHANG, Yi ZOU, Chenxi LIN, Yana CHENG, Simon Philip Spencer HASTINGS, Maxim Philippe Frederic GENIN