Patents by Inventor Nicolas Alban Lallemant
Nicolas Alban Lallemant has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10268128Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.Type: GrantFiled: June 14, 2016Date of Patent: April 23, 2019Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph Janssen, Johannes Paul Marie De La Rosette, Edwin Cornelis Kadijk, Nicolas Alban Lallemant, Jan Liefooghe, Markus Rolf Werner Matthes, Marcel Johannus Elisabeth Hubertus Muitjens, Hubert Matthieu Richard Steijns, André Gillis Van De Velde, Marinus Aart Van Den Brink
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Publication number: 20180196361Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.Type: ApplicationFiled: June 14, 2016Publication date: July 12, 2018Applicant: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph JANSSEN, Johannes Paul Marie DE LA ROSETTE, Edwin Cornelis KADIJK, Nicolas Alban LALLEMANT, Jan LIEFOOGHE, Markus Rolf Werner MATTHES, Marcel Johannus Elisabeth MUITJENS, Hubert Matthieu Richard STEIJNS, André Gillis VAN DE VELDE, Marinus Aart VAN DEN BRINK
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Patent number: 9482967Abstract: An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.Type: GrantFiled: September 21, 2011Date of Patent: November 1, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus Van De Kerkhof, Johannes Henricus Wilhelmus Jacobs, Tammo Uitterdijk, Nicolas Alban Lallemant
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Publication number: 20120008113Abstract: An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.Type: ApplicationFiled: September 21, 2011Publication date: January 12, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Johnnes Henricus Wilhelmus JACOBS, Tammo UITTERDIJK, Nicolas Alban LALLEMANT
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Patent number: 8045134Abstract: An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.Type: GrantFiled: March 13, 2006Date of Patent: October 25, 2011Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Johannes Henricus Wilhelmus Jacobs, Tammo Uitterdijk, Nicolas Alban Lallemant
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Patent number: 7557903Abstract: A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.Type: GrantFiled: December 8, 2005Date of Patent: July 7, 2009Assignee: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina Schoormans, Emiel Jozef Melanie Eussen, Willem Herman Gertruda Anna Koenen, Nicolas Alban Lallemant, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Mathias Theodorus Antonius Adriaens
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Patent number: 7271873Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: GrantFiled: May 22, 2006Date of Patent: September 18, 2007Assignee: ASML Netherlands B.V.Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Fransiscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus
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Patent number: 7271917Abstract: A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.Type: GrantFiled: May 3, 2005Date of Patent: September 18, 2007Assignee: ASML Netherlands B.V.Inventors: Edwin Teunis Van Donkelaar, Evert Hendrink Jan Draaijer, Leon Martin Levasier, Nicolas Alban Lallemant, Gerardus Martinus Antonius De Rooij
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Patent number: 7072021Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: GrantFiled: June 28, 2004Date of Patent: July 4, 2006Assignee: ASML Netherlands B.V.Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Franciscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus