Patents by Inventor Nicolas Blondiaux

Nicolas Blondiaux has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11434131
    Abstract: Method of manufacturing a micromechanical component intended to cooperate with another micromechanical component, the method comprising the steps of providing a substrate, forming a mould on said substrate, said mould defining sidewalls arranged to delimit said micromechanical component, providing particles on at least said sidewalls, depositing a metal in said mould so as to form said micromechanical component, and liberating said micromechanical component from said mould and removing said particles.
    Type: Grant
    Filed: February 17, 2021
    Date of Patent: September 6, 2022
    Assignee: CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA—RECHERCHE ET DÉVELOPPEMENT
    Inventors: Nicolas Blondiaux, Raphaël Pugin
  • Publication number: 20220199843
    Abstract: Method of manufacturing a photovoltaic cell, comprising the steps of: providing a photovoltaic conversion device; providing a transparent conductive oxide layer upon at least a first face of said photovoltaic conversion device; forming a self-assembled monolayer on said transparent conductive oxide layer, said self-assembled monolayer being based on molecules terminated by at least one group F which is chosen from: a phosphonic acid group, a P(O)O2?M+ group, a OPO3H2 group, or an OP(O)O2?M+ group, wherein M+ is a metal cation; patterning said self-assembled monolayer so as to define at least one plateable zone in which said transparent conductive oxide layer is exposed; plating a metal onto said at least one plateable zone.
    Type: Application
    Filed: May 20, 2020
    Publication date: June 23, 2022
    Applicant: CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA - RECHERCHE ET DÉVELOPPEMENT
    Inventors: Gaëlle ANDREATTA, Christophe ALLEBE, Agata LACHOWICZ, Nicolas BLONDIAUX, Antonin FAES
  • Publication number: 20210171340
    Abstract: Method of manufacturing a micromechanical component intended to cooperate with another micromechanical component, the method comprising the steps of providing a substrate, forming a mould on said substrate, said mould defining sidewalls arranged to delimit said micromechanical component, providing particles on at least said sidewalls, depositing a metal in said mould so as to form said micromechanical component, and liberating said micromechanical component from said mould and removing said particles.
    Type: Application
    Filed: February 17, 2021
    Publication date: June 10, 2021
    Applicant: CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement
    Inventors: Nicolas BLONDIAUX, Raphaël PUGIN
  • Patent number: 10954123
    Abstract: Method of manufacturing a micromechanical component intended to cooperate with another micromechanical component, the method comprising the steps of providing a substrate, forming a mould on said substrate, said mould defining sidewalls arranged to delimit said micromechanical component, providing particles on at least said sidewalls, depositing a metal in said mould so as to form said micromechanical component, and liberating said micromechanical component from said mould and removing said particles.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: March 23, 2021
    Assignee: CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA—RECHERCHE ET DÉVELOPPEMENT
    Inventors: Nicolas Blondiaux, Raphaël Pugin
  • Publication number: 20190367359
    Abstract: Method of manufacturing a micromechanical component intended to cooperate with another micromechanical component, the method comprising the steps of providing a substrate, forming a mould on said substrate, said mould defining sidewalls arranged to delimit said micromechanical component, providing particles on at least said sidewalls, depositing a metal in said mould so as to form said micromechanical component, and liberating said micromechanical component from said mould and removing said particles.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 5, 2019
    Applicant: CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement
    Inventors: Nicolas BLONDIAUX, Raphaël PUGIN
  • Patent number: 9430733
    Abstract: A security device for the identification or authentication of valuable goods is described, including a thin material layer (22, 26) presenting a stochastic pattern including micro/submicrostructures, where the latter are arranged in blobs (2) each of which presents a complexity factor Cx = L 2 4 ? ? · A , where L is the perimeter of the blob and A its area, and wherein blobs having a Cx value greater than or equal to 2 cover at least 5%, preferably at least 15%, of the device surface. According to a preferred embodiment, the material layer may include a film including at least a first and a second polymers arranged respectively within a first and a second phases defining the micro/submicrostructures. Preferred processes of fabrication are also disclosed, as well as a method for securing a valuable good based on such a security device.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: August 30, 2016
    Assignee: CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA—RECHERCHE ET DEVELOPPEMENT
    Inventors: Nicolas Blondiaux, David Hasler, Raphael Pugin, Edoardo Franzi
  • Patent number: 8542442
    Abstract: The present invention relates to an isotropic zero-order diffractive color filter, to a method to manufacture an embossing tool and to a method to manufacture such a filter. The zero-order diffractive color filter comprises diffractive microstructures and a wave-guiding layer, wherein the diffractive microstructures possess a short range ordering over at least four times the period of the microstructures, and the diffractive microstructures possess a long range disordering over length scales of more than 100 ?m.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: September 24, 2013
    Assignee: Centre Suisse d'Electronique et de Microtechnique SA—Recherche et Developpement
    Inventors: Nicolas Blondiaux, Mickaël Guillaumee, Raphaël Pugin, Ross Stanley, Alexander Stuck, Harald Walter
  • Publication number: 20100195916
    Abstract: A security device for the identification or authentication of valuable goods is described, including a thin material layer (22, 26) presenting a stochastic pattern including micro/submicrostructures, where the latter are arranged in blobs (2) each of which presents a complexity factor Cx = L 2 4 ? ? · A , where L is the perimeter of the blob and A its area, and wherein blobs having a Cx value greater than or equal to 2 cover at least 5%, preferably at least 15%, of the device surface. According to a preferred embodiment, the material layer may include a film including at least a first and a second polymers arranged respectively within a first and a second phases defining the micro/submicrostructures. Preferred processes of fabrication are also disclosed, as well as a method for securing a valuable good based on such a security device.
    Type: Application
    Filed: May 7, 2008
    Publication date: August 5, 2010
    Applicant: CSEM Centre Suisse d'Electronique ef de Microtechn
    Inventors: Nicolas Blondiaux, David Hasler, Raphael Pugin, Edoardo Franzi
  • Publication number: 20090008925
    Abstract: A security device for the identification or authentication of goods is described. It comprises a stochastic pattern comprising structures having an average lateral structure size d and arranged such that an image of at least a part of the security device, when treated through 2D Fourier transformation and calculation of a corresponding Power Spectrum Density, may lead to a peak, in a spatial-frequency domain, having a position in this domain correlated to d and a size distribution value w which, when inverted, is correlated to a size distribution of the structures. The value w according to the invention is smaller than 2/d, so that when directing a coherent light beam on at least part of the structures a ring-shaped scattering speckle pattern is formed, on the basis of which d and w may be calculated to implement identification or authentication of the device.
    Type: Application
    Filed: May 7, 2008
    Publication date: January 8, 2009
    Inventors: Nicolas BLONDIAUX, Ulrich Gubler, Raphael Pugin, Alexander Stuck, Harald Walter
  • Publication number: 20080278815
    Abstract: The present invention relates to an isotropic zero-order diffractive colour filter, to a method to manufacture an embossing tool and to a method to manufacture such a filter. The zero-order diffractive colour filter comprises diffractive microstructures and a wave-guiding layer, wherein the diffractive microstructures possess a short range ordering over at least four times the period of the microstructures, and the diffractive microstructures possess a long range disordering over length scales of more than 100 ?m.
    Type: Application
    Filed: May 7, 2008
    Publication date: November 13, 2008
    Inventors: Nicolas Blondiaux, Mickael Guillaumee, Raphael Pugin, Ross Stanley, Alexander Stuck, Harald Walter