Patents by Inventor Nicolas Carriere

Nicolas Carriere has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8248498
    Abstract: Microelectronic image sensor array device comprising a plurality of elementary cells laid out according to an array and each provided with at least one photosensitive zone for capturing photon(s) and converting photon(s) into electron(s), at least one or several of said cells comprising electronic avalanche multiplier means, provided to produce, during cycles known as electron amplification cycles, a greater number of electrons than the number of electrons converted by the photosensitive zone, the device further comprising a control circuit adapted to modulate the amplification gain of each cell individually.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: August 21, 2012
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Nicolas Carriere
  • Publication number: 20090167910
    Abstract: Microelectronic image sensor array device comprising a plurality of elementary cells laid out according to an array and each provided with at least one photosensitive zone for capturing photon(s) and converting photon(s) into electron(s), at least one or several of said cells comprising electronic avalanche multiplier means, provided to produce, during cycles known as electron amplification cycles, a greater number of electrons than the number of electrons converted by the photosensitive zone, the device further comprising a control circuit adapted to modulate the amplification gain of each cell individually.
    Type: Application
    Filed: December 9, 2008
    Publication date: July 2, 2009
    Inventor: Nicolas Carriere
  • Publication number: 20050079695
    Abstract: A phase of siliciding a transistor includes formation, from a first metal (8), of a first metal silicide (80) on the drain and source regions, while the gate region (30) is protected by a layer of hard mask (40), removal of the hard mask, formation, from a second metal (9), of a second metal silicide (90) on the gate region, while the first metal silicide (80) is protected by the second metal (9), and removal of the second metal (9).
    Type: Application
    Filed: March 25, 2004
    Publication date: April 14, 2005
    Applicants: STMICROELECTRONICS SA, COMMISSARIAT A L'ENERGIE ATOMIQUE
    Inventors: Nicolas Carriere, Thomas Skotnicki, Brice Tavel