Abstract: A setting method includes setting the conductances of the controllable restrictions of an airborne molecular contamination measurement station. The setting method includes an initial identification step, prior to the carrying-out of an airborne molecular contamination measurement step, and during which the sampling line that has the lowest conductance when the conductance of the controllable restriction of the said sampling line is set to its maximum value is determined, and an initial conductance-setting step prior to the carrying-out of the measurement step and after the initial identification step, and during which the conductances of the controllable restrictions are set to make them correspond to the lowest conductance determined in the initial identification step. Further, a measurement station is provided for measuring airborne molecular contamination.

Abstract: There is provided a device and method for controlling a tightness of at least one transport enclosure for conveyance and atmospheric storage of semiconductor substrates, the transport enclosure including at least two ventilation ports, the device including at least one interface configured to be coupled to the transport enclosure, the interface including at least two connecting heads, at least one connecting head of the heads being formed by a measurement head configured to engage in a ventilation port of the ventilation ports of the transport enclosure, the measurement head including a projecting end piece, opening through at least one aperture, and a peripheral sealing element surrounding the end piece, all of the ventilation ports of the transport enclosure being coupled to the connecting head of the interface. There is also provided a method for controlling the tightness of the transport enclosure.

Abstract: A setting method includes setting the conductances of the controllable restrictions of an airborne molecular contamination measurement station. The setting method includes an initial identification step, prior to the carrying-out of an airborne molecular contamination measurement step, and during which the sampling line that has the lowest conductance when the conductance of the controllable restriction of the said sampling line is set to its maximum value is determined, and an initial conductance-setting step prior to the carrying-out of the measurement step and after the initial identification step, and during which the conductances of the controllable restrictions are set to make them correspond to the lowest conductance determined in the initial identification step. Further, a measurement station is provided for measuring airborne molecular contamination.

Abstract: There is provided a device and method for controlling a tightness of at least one transport enclosure for conveyance and atmospheric storage of semiconductor substrates, the transport enclosure including at least two ventilation ports, the device including at least one interface configured to be coupled to the transport enclosure, the interface including at least two connecting heads, at least one connecting head of the heads being formed by a measurement head configured to engage in a ventilation port of the ventilation ports of the transport enclosure, the measurement head including a projecting end piece, opening through at least one aperture, and a peripheral sealing element surrounding the end piece, all of the ventilation ports of the transport enclosure being coupled to the connecting head of the interface. There is also provided a method for controlling the tightness of the transport enclosure.

Abstract: The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: a step in which the measuring module (5) couples to the rigid casing (2), thereby defining a first measuring volume (V1) between the casing-measuring interface (16) and the coupled rigid casing (2) in order to measure contamination of the internal walls of the rigid casing (2); and a step in which the door (3) couples to the measuring module (5), thereby defining a second measuring volume (V2) between said measuring face (22) and the opposite door (3) in order to measure contamination of the door (3). The invention also relates to an associated measuring station.

Abstract: The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: a step in which the measuring module (5) couples to the rigid casing (2), thereby defining a first measuring volume (V1) between the casing-measuring interface (16) and the coupled rigid casing (2) in order to measure contamination of the internal walls of the rigid casing (2); and a step in which the door (3) couples to the measuring module (5), thereby defining a second measuring volume (V2) between said measuring face (22) and the opposite door (3) in order to measure contamination of the door (3). The invention also relates to an associated measuring station.

Abstract: The invention concerns a cashew apple extract and a composition comprising a cashew apple extract and optionally a carrier, in particular for use for allowing reduction of body weight gain or limitation of increasing body weight, reduction or limitation of fat storage, of fatty liver, of liver triglycerides level, of hypertriglyceridemia, of glycemia level, of insulinemia, of insulin resistance, and/or of one or several factors of metabolic syndrome.

Abstract: The object of the present invention is a mount for a rotating target, roughly disk-shaped and perforated at its center. The mount is made of a material which a structurally hardened nickel-based superalloy. The mount is disk-shaped with a narrower area at its periphery, and the narrow peripheral area and the thick area surrounding the central orifice are separated by a discontinuous area whose slope is between 3° and 10°, with the thickness ratio between the narrow peripheral area and the thick area surrounding the central orifice being between 1.5 and 3. The superalloy is an Inconel that has undergone a structural hardening treatment after machining. At least one of the mount's surfaces is coated with an emissive coating used to discharge heat through thermal radiation.