Patents by Inventor Nicolas Eib

Nicolas Eib has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Yield-limiting design-rules-compliant pattern library generation and layout inspection
    Publication number: 20070157153
    Abstract: A method and system is provided for analyzing process window compliance of an integrated circuit design. Aspects of the present invention include identifying layout pattern configurations that have process windows that fail to meet respective local performance specifications; searching for any layout pattern configurations in a design that substantially match any of the identified layout pattern configurations; and modifying any matching layout pattern configurations found in the design to make the layout pattern configurations compliant with their respective process windows.
    Type: Application
    Filed: December 30, 2005
    Publication date: July 5, 2007
    Inventors: Ebo Croffie, Nicolas Eib