Patents by Inventor Nicolas Kaufmann

Nicolas Kaufmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128048
    Abstract: A method for operating a multi-beam particle microscope which operates using a plurality of individual charged particle beams, wherein the method includes the following steps: measuring the beam current; determining a deviation of the measured beam current from a nominal beam current; decomposing the determined deviation into a drift component and into a high-frequency component; and controlling the high-frequency component of the beam current via a first closed-loop beam current control mechanism and/or compensating an effect of the high-frequency component on a recording quality of the multi-beam particle microscope using different mechanism than a closed-loop beam current control mechanism. An electrostatic control lens arranged in the beam generating system between extractor and anode can be used as first closed-loop beam current control mechanism. Adapting an extractor voltage of the beam generating system can be avoided.
    Type: Application
    Filed: December 21, 2023
    Publication date: April 18, 2024
    Inventors: Ingo Mueller, Nicolas Kaufmann, Michael Behnke, Hans Fritz
  • Publication number: 20230043036
    Abstract: A multi-beam charged particle inspection system and a method of operating a multi-beam charged particle inspection system for wafer inspection can provide high throughput with high resolution and high reliability. The method and the multi-beam charged particle beam inspection system can be configured to extract from a plurality of sensor data a set of control signals to control the multi-beam charged particle beam inspection system and thereby maintain the imaging specifications including a movement of a wafer stage during the wafer inspection task.
    Type: Application
    Filed: October 18, 2022
    Publication date: February 9, 2023
    Inventors: Dirk Zeidler, Ulrich Bihr, Andreas Adolf, Nicolas Kaufmann, Ingo Mueller, Michael Behnke
  • Publication number: 20220351936
    Abstract: A multi-beam charged particle microscope and a method of operating a multi-beam charged particle microscope for wafer inspection with high throughput and with high resolution and high reliability are provided. The method of operation and the multi-beam charged particle beam microscope comprises a mechanism for a synchronized scanning operation and image acquisition by a plurality of charged particle beamlets according a selected scan program, wherein the selected scan program can be selected according an inspection task from different scan programs.
    Type: Application
    Filed: July 19, 2022
    Publication date: November 3, 2022
    Inventors: Nicolas Kaufmann, Andreas Adolf, Volker Wieczorek, Nico Kaemmer, Christof Riedesel, Stefan Schubert