Abstract: A method is provided for producing a foil made of an electrically conductive material. The foil consists of the same electrically conductive material along the extension of the foil thickness. A flexible substrate is first introduced into a working chamber; a layer made of the electrically conductive material is deposited on at least one surface region of the flexible substrate using a vacuum coating process; and the first layer is then removed from the flexible substrate. Either an ion-etching process is carried out at least on the surface region of the flexible substrate prior to depositing the layer made of the electrically conductive material and/or the layer made of the electrically conductive material is heated during and/or after the layer is deposited.

Abstract: A method for depositing a graphene-based layer on a substrate by means of chemical vapor deposition is provided in which at least one hydrocarbon is introduced into a vacuum chamber as a starting material for a chemical reaction and, concurrently, a plasma is formed inside the vacuum chamber. In this case, at least one magnetron is used to generate the plasma, where the magnetron comprises at least one target of a material comprising at least one catalytically active metal selected from the group of chemical elements having the atomic numbers 21 to 30, 39 to 48, 57, 72 to 80 and 89; and where the sputtering of the target is set in such a way that the fraction of target particles, embedded in the graphene-based layer, is less than 1 at %.

Abstract: Methods are provided for production of a composite layer comprising a plastic foil and a layer deposited directly thereon. A method for production of a composite layer comprising a plastic foil and at least one layer deposited directly onto the plastic foil by means of chemical gas-phase deposition within a vacuum chamber may be provided, wherein the plastic foil has a proportion of at least 20 percent by mass of a metal element or of a semiconductor element, wherein during the layer deposition, at least one monomer is supplied into the vacuum chamber and a plasma is formed within the vacuum chamber. After completed deposition of the layer, at least one surface region of the layer is exposed to accelerated electrons.

Abstract: The invention relates to a method for producing a transparent bather layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas and a gaseous or vaporous organic component are introduced into the vacuum chamber.

Abstract: The invention relates to a method for producing a transparent barrier layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas is introduced into the vacuum chamber, and a silicon-containing layer is deposited as intermediate layer by means of a PECVD process.

Abstract: A transparent plastic film for screening electromagnetic waves includes a transparent film substrate and a layer system comprising at least one silver layer and two niobium oxide layers. The silver layer is embedded between the two niobium oxide layers.

Abstract: The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Abstract: A transparent barrier film, includes a transparent thermoplastic film and at least one permeation barrier film. The permeation barrier film includes a chemical compound of the elements zinc, tin and oxygen. A mass fraction of zinc is 5% to 70%. Furthermore, a method is disclosed for the production of a barrier film of this type.

Abstract: The invention relates to a transparent barrier layer system on a substrate, wherein the barrier layer system comprises a sequence of individual layers, wherein the individual layers are composed alternately of a layer A and a layer B and wherein a layer A differs from a layer B in terms of the activation energy in the permeation of water vapor with a difference of at least 1.5 kJ/mol.

Abstract: The invention relates to a transparent plastic film for screening electromagnetic waves, comprising a transparent film substrate and a layer system that has at least one silver layer, as well as a method for producing a plastic film of this type, wherein the silver layer is embedded between two niobium oxide layers.

Abstract: A method for producing a flexible circuit board material having a polymer substrate and a copper layer. The method includes depositing a layer of titanium oxide to be between the polymer substrate and the copper layer. The layer of titanium oxide and the copper layer are deposited using vacuum methods.

Abstract: The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.

Abstract: The invention relates to a transparent barrier film, comprising a transparent thermoplastic film and at least one permeation barrier layer, wherein the permeation barrier layer comprises a chemical compound of the elements zinc, tin and oxygen, and the mass fraction of zinc is 5% to 70%. Furthermore, the invention relates to a method for the production of a barrier film of this type.

Abstract: The invention relates to an antimicrobial material and a method for producing an antimicrobial material, which is deposited on a substrate (2), comprising the steps: Providing the substrate (2) in a vacuum working chamber (3); atomizing a biocidal metal by means of a sputtering device inside the vacuum working chamber (3) in the presence of an inert gas; simultaneous introduction of a precursor, which contains silicon, carbon, hydrogen and oxygen, into the vacuum working chamber (3) so that the sputtered metal particles and the precursor are exposed to a plasma action; deposition of a material on the substrate (2) such that a matrix is formed through the plasma activation of the precursor, in which matrix clusters of sputtered metal particles are incorporated.

Abstract: The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

Abstract: The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Abstract: The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

Abstract: The invention relates to a method for producing UV-absorbing transparent wear protection layers by vacuum coating in which at the same time or immediately one after the other at least one inorganic compound that forms layers with high wear resistance and an inorganic compound that forms layers with high UV-absorption are deposited on a substrate respectively by means of reactive or partially reactive plasma-aided high-rate deposition.

Abstract: The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.

Abstract: Method for producing at least one organically-modified oxide, oxinitride or nitride layer by vacuum coating on a substrate through plasma-enhanced evaporation of evaporation material comprising nitride-forming evaporation material and one of oxide and suboxide evaporation material, wherein the at least one layer is deposited through plasma-enhanced, reactive high-rate evaporation of the evaporation material with use of gaseous monomers and a reactive gas including at least one of oxygen and nitrogen, and wherein the evaporation material, gaseous monomers, and reactive gas pass through a high-density plasma zone immediately in front of the substrate.