Patents by Inventor Nicolas SCHMIDT

Nicolas SCHMIDT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240068540
    Abstract: The disclosure relates to a vibration damper for a vehicle, comprising an outer tube and an inner tube which is arranged coaxially relative thereto, wherein between the outer tube and the inner tube a compensation chamber for receiving hydraulic fluid is formed, and a working piston which is connected to a piston rod and which is arranged so as to be able to be moved back and forth within the inner tube, wherein the inner space of the inner tube is divided by the working piston into a first working chamber and a second working chamber, wherein in the compensation chamber there is arranged a calming element which is fitted so as to be able to be moved in an axial direction inside the compensation chamber.
    Type: Application
    Filed: August 24, 2023
    Publication date: February 29, 2024
    Applicants: thyssenkrupp Bilstein GmbH, thyssenkrupp AG
    Inventors: Tim NORUSCHAT, Nicolas SUMKOETTER, Klaus SCHMIDT
  • Patent number: 9482959
    Abstract: An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: November 1, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Nicolas Schmidts, Joachim Hartjes, Ulrich Bingel, Boaz Pnini-Mittler
  • Patent number: 9108710
    Abstract: A pontoon boat has left and right pontoons extending longitudinally, a tunnel therebetween, and a deck supported thereon. Bow and stern ends, and a boat length therebetween, are defined by at least one of the pontoons and the deck. An opening of the deck communicating with a tunnel thereunder has an outboard engine mounted therein and a hatch disposed thereover. A longitudinal center plane is vertical and equidistant from the bow and stern ends. A drive unit of the engine has a driveshaft, a propeller shaft operatively connected thereto, and a propeller connected to the propeller shaft. A mounting bracket connects the drive unit to the deck. The engine is disposed forward of the stern end by a distance at least equal to one-fourth of the boat length. The engine is aligned with or rearward of a longitudinal center plane. A method of operating the pontoon boat is also disclosed.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: August 18, 2015
    Assignee: BRP US INC.
    Inventors: Richard McChesney, George Broughton, Nicolas Schmidt
  • Publication number: 20120069313
    Abstract: An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.
    Type: Application
    Filed: September 1, 2011
    Publication date: March 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Nicolas Schmidts, Joachim Hartjes, Ulrich Bingel, Boaz Pnini-Mittler
  • Publication number: 20100114516
    Abstract: A measurement system including a plurality of test and measurement instruments; and a hub coupled to each of the test and measurement instruments. Each of the test and measurement instruments is configured to trigger an acquisition in response to a hub event received from the hub. Acquisitions can be triggered from one, some, any, or all of the test and measurement instruments.
    Type: Application
    Filed: June 26, 2009
    Publication date: May 6, 2010
    Applicant: TEKTRONIX, INC.
    Inventors: Zhongsheng WANG, Que T. TRAN, Nicolas SCHMIDT